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Fabrication and Characterization of Compact Silicon Oxynitride Waveguides on Silicon Chips
We investigate silicon oxynitride (SiON) waveguides for long optical delay lines on a silicon chip. With the choice of a moderately low refractive index contrast, a balance can be achieved between compact waveguide cross-section and low loss. The material composition and refractive index are charact...
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Main Authors: | , , , , , , |
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Format: | Report |
Language: | English |
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Online Access: | Request full text |
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Summary: | We investigate silicon oxynitride (SiON) waveguides for long optical delay lines on a silicon chip. With the choice of a moderately low refractive index contrast, a balance can be achieved between compact waveguide cross-section and low loss. The material composition and refractive index are characterized by Rutherford backscattering spectrometry and ellipsometry. High-temperature annealing is performed after waveguide fabrication so as to simultaneously remove light absorbing bonds in the materials and smooth the sidewall roughness at the core?cladding interface. A meter-long SiON waveguide is demonstrated on a centimeter scale chip.
Published in Journal of Optics, v14 p1-6, 2012. |
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