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Fabrication and Characterization of Compact Silicon Oxynitride Waveguides on Silicon Chips

We investigate silicon oxynitride (SiON) waveguides for long optical delay lines on a silicon chip. With the choice of a moderately low refractive index contrast, a balance can be achieved between compact waveguide cross-section and low loss. The material composition and refractive index are charact...

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Bibliographic Details
Main Authors: Yin, Lianghong, Lu, Ming, Wielunski, Leszek, Song, Weiwei, Tan, Jun, Lu, Yicheng, Jiang, Wei
Format: Report
Language:English
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Summary:We investigate silicon oxynitride (SiON) waveguides for long optical delay lines on a silicon chip. With the choice of a moderately low refractive index contrast, a balance can be achieved between compact waveguide cross-section and low loss. The material composition and refractive index are characterized by Rutherford backscattering spectrometry and ellipsometry. High-temperature annealing is performed after waveguide fabrication so as to simultaneously remove light absorbing bonds in the materials and smooth the sidewall roughness at the core?cladding interface. A meter-long SiON waveguide is demonstrated on a centimeter scale chip. Published in Journal of Optics, v14 p1-6, 2012.