Smart 45nm Foundry CMOS with Mask-Lite (trademark) Reduced Mask Costs

American Semiconductor has created Mask-Lite which is a layout and fabrication strategy that reduces mask costs and improves access to advanced 45nm bulk CMOS from their ITAR registered and TRUSTED ready on-shore commercial foundry. 2011 ReSPACE/MAPLD Conference, 22-25 Aug 2011, Albuquerque, Prepare...

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Bibliographic Details
Main Authors: Chaney, Richard L, Wilson, Dale G, Hackler, Sr, Douglas R, Hebert, Kenneth
Format: Report
Language:English
Subjects:
1D LAYOUT
45NM
BULK CMOS
COMPLEMENTARY METAL OXIDE SEMICONDUCTORS
Electrical and Electronic Equipment
FABRICATION
GRATED LAYOUT
MASK-LITE
MASKS
PHOTOMASKING
PHOTOMASKS
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Summary:American Semiconductor has created Mask-Lite which is a layout and fabrication strategy that reduces mask costs and improves access to advanced 45nm bulk CMOS from their ITAR registered and TRUSTED ready on-shore commercial foundry. 2011 ReSPACE/MAPLD Conference, 22-25 Aug 2011, Albuquerque, Prepared in collaboration with American Semiconductor, Inc., Boise, ID. NM. U.S. Government or Federal Rights License