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Chemical Vapor Deposition of Atomically-Thin Molybdenum Disulfide (MoS2)

A method of synthesizing monolayers of molybdenum disulfide (MoS2) via chemical vapor deposition is described. In this process a tube furnace is used to evaporate MoS2 over silicon/silicon dioxide substrates. Sulfur is then evaporated and flown over the substrates via a stream of inert gas. Optical...

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Bibliographic Details
Main Authors: Kaplan, Daniel, Mills, Kendall, Swaminathan, Venkataraman
Format: Report
Language:English
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Summary:A method of synthesizing monolayers of molybdenum disulfide (MoS2) via chemical vapor deposition is described. In this process a tube furnace is used to evaporate MoS2 over silicon/silicon dioxide substrates. Sulfur is then evaporated and flown over the substrates via a stream of inert gas. Optical and scanning electron microscopy and Raman spectroscopy are utilized to characterize the growth of the MoS2 monolayers. Density-functional theory simulations are used to compare theoretical predictions to the observed photoluminescence The original document contains color images.