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Specific features of the structure and properties of carbon nanocolumns formed by low-temperature chemical vapor deposition

The process of the formation of column-shaped carbon nanostructures by plasma-enhanced chemical vapor deposition is explored. Carbon nanocolumns are formed at 250°C. The structure and properties of the structures are studied by atomic-force microscopy, scanning electron microscopy, transmission elec...

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Bibliographic Details
Published in:Semiconductors (Woodbury, N.Y.) N.Y.), 2013-12, Vol.47 (13), p.1703-1706
Main Authors: Gromov, D. G., Borgardt, N. I., Volkov, R. L., Galperin, V. A., Grishina, Ya. S., Dubkov, S. V.
Format: Article
Language:English
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Summary:The process of the formation of column-shaped carbon nanostructures by plasma-enhanced chemical vapor deposition is explored. Carbon nanocolumns are formed at 250°C. The structure and properties of the structures are studied by atomic-force microscopy, scanning electron microscopy, transmission electron microscopy, and Raman spectroscopy. The electrical properties of the structures are investigated.
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782613130095