Aerosol deposition of detonation nanodiamonds used as nucleation centers for the growth of nanocrystalline diamond films and isolated particles

• Published in: Technical physics 2011-05, Vol.56 (5), p.718-724
• Main Authors: Feoktistov, N. A., Sakharov, V. I., Serenkov, I. T., Tolmachev, V. A., Korkin, I. V., Aleksenskii, A. E., Vul’, A. Ya, Golubev, V. G.
• Format: Article
• Language: English
• Subjects: Chemical vapor deposition; Classical and Continuum Physics; Diamond films; Electron and Ion Emission; Growth; Physics; Physics and Astronomy; Surface; Toy industry
• ISSN: 1063-7842; 1090-6525
• DOI: 10.1134/S1063784211050112

The aerosol deposition of detonation nanodiamonds (DNDs) on a silicon substrate is comprehensively studied, and the possibility of subsequent growth of nanocrystalline diamond films and isolated particles on substrates coated with DNDs is demonstrated. It is shown that a change in the deposition time and the weight concentration of DNDs in a suspension in the range 0.001–1% results in a change in the shape of DND agglomerates and their number per unit substrate surface area N s from 10 8 to 10 11 cm −2 . Submicron isolated diamond particles are grown on a substrate coated with DND agglomerates at N s ≈ 108 cm −2 using microwave plasma-enhanced chemical vapor deposition. At N s ≈ 10 10 cm −2 , thin (∼100 nm) nanodiamond films with a root-mean-square surface roughness less than 15 nm are grown.