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Optimization of the deposition technique of thin ITO films used as transparent conducting contacts for blue and near-UV LEDs

Structural, optical, and electrical properties of indium-tin oxide (ITO) films produced by electron-beam evaporation, magnetron sputtering, and a combined method are studied. It is demonstrated that, despite the high transparency of the electron-beam-deposited ITO films in the visible spectral range...

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Bibliographic Details
Published in:Semiconductors (Woodbury, N.Y.) N.Y.), 2014, Vol.48 (1), p.58-62
Main Authors: Smirnova, I. P., Markov, L. K., Pavlyuchenko, A. S., Kukushkin, M. V., Pavlov, S. I.
Format: Article
Language:English
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Summary:Structural, optical, and electrical properties of indium-tin oxide (ITO) films produced by electron-beam evaporation, magnetron sputtering, and a combined method are studied. It is demonstrated that, despite the high transparency of the electron-beam-deposited ITO films in the visible spectral range, their conductivity and refractive index are noticeably lower than the respective parameters of ITO films deposited by magnetron sputtering. A technique for the fabrication of double-layer systems by the combination of these two deposition techniques is developed. As a result, we obtained the films, which possess the advantages of magnetron-sputtered layers and can be used as contact layers to p -type GaN in LEDs for the blue and nearultraviolet (near-UV) spectral ranges.
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782614010230