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Optimization of the deposition technique of thin ITO films used as transparent conducting contacts for blue and near-UV LEDs
Structural, optical, and electrical properties of indium-tin oxide (ITO) films produced by electron-beam evaporation, magnetron sputtering, and a combined method are studied. It is demonstrated that, despite the high transparency of the electron-beam-deposited ITO films in the visible spectral range...
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Published in: | Semiconductors (Woodbury, N.Y.) N.Y.), 2014, Vol.48 (1), p.58-62 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Structural, optical, and electrical properties of indium-tin oxide (ITO) films produced by electron-beam evaporation, magnetron sputtering, and a combined method are studied. It is demonstrated that, despite the high transparency of the electron-beam-deposited ITO films in the visible spectral range, their conductivity and refractive index are noticeably lower than the respective parameters of ITO films deposited by magnetron sputtering. A technique for the fabrication of double-layer systems by the combination of these two deposition techniques is developed. As a result, we obtained the films, which possess the advantages of magnetron-sputtered layers and can be used as contact layers to
p
-type GaN in LEDs for the blue and nearultraviolet (near-UV) spectral ranges. |
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ISSN: | 1063-7826 1090-6479 |
DOI: | 10.1134/S1063782614010230 |