Thermal decomposition of some organotellurium compounds based on di(cyclohexylmethyl) telluride

• Published in: Journal of thermal analysis and calorimetry 2015-11, Vol.122 (2), p.699-703
• Main Authors: Al-Rubaie, Ali Z., Al-Derawi, Alaa K., Abd Al-Wahed, Anwar T.
• Format: Article
• Language: English
• Subjects: Analytical Chemistry; Chemistry; Chemistry and Materials Science; Inorganic Chemistry; Measurement Science and Instrumentation; Physical Chemistry; Polymer Sciences; Pyrolysis
• ISSN: 1388-6150; 1588-2926
• DOI: 10.1007/s10973-015-4794-7

The thermal behavior of some new organotellurium compounds, based on di(cyclohexylmethyl) telluride [i.e., (C 6 H 11 CH 2 ) 2 Te(R)X: R, X  = I, I ( 1 ); Br, Br ( 2 ); CH 3 , I ( 3 ); C 6 H 5 CH 2 , Br ( 4 ); C 6 H 5 , BPh 4 ( 5 ); CH 3, BPh 4 ( 6 )] studied by thermogravimetric analysis. The organic moieties of compounds 1 and 2 were completely vaporized at 212 and 258 °C, respectively, leading to the deposition tellurium metal. Compounds 3 and 4 decomposed in two stages, losing RX in the first stage and depositing tellurium metal with formation of volatile 1,2-dicyclohexylethane in the second stage. Mass spectra of compounds 1 , 2 , 3 and 4 indicate the formation of 1,2-dicyclohexylethane and the association of compounds 2 and 3 in the gas phase. Oxoborinic acid (HBO 2 ) is the residual product for the thermal decomposition of compounds 5 and 6 at 228 and 250 °C, respectively. No B 2 Te 3 was formed during the thermolysis of these two compounds. Mechanisms for the decomposition of all compounds were proposed and discussed.