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Analog Resistive Switching and Artificial Synaptic Behavior of ITO/WO[sub.X]/TaN Memristors
In this work, we fabricated an ITO/WO[sub.X]/TaN memristor device by reactive sputtering to investigate resistive switching and conduct analog resistive switching to implement artificial synaptic devices. The device showed good pulse endurance (10[sup.4] cycles), a high on/off ratio (>10), and lo...
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Published in: | Materials 2023-02, Vol.16 (4) |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
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Summary: | In this work, we fabricated an ITO/WO[sub.X]/TaN memristor device by reactive sputtering to investigate resistive switching and conduct analog resistive switching to implement artificial synaptic devices. The device showed good pulse endurance (10[sup.4] cycles), a high on/off ratio (>10), and long retention (>10[sup.4] s) at room temperature. The conduction mechanism could be explained by Schottky emission conduction. Further, the resistive switching characteristics were performed by additional pulse-signal-based experiments for more practical operation. Lastly, the potentiation/depression characteristics were examined for 10 cycles. The results thus indicate that the WO[sub.X]-based devices are appropriate candidates for synaptic devices as well as next-generation nonvolatile memory. |
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ISSN: | 1996-1944 1996-1944 |
DOI: | 10.3390/ma16041687 |