Study on ZrSi[sub.2] as a Candidate Material for Extreme Ultraviolet Pellicles

• Published in: Membranes (Basel) 2023-08, Vol.13 (8)
• Main Authors: Wi, Seong Ju, Kim, Won Jin, Kim, Haneul, Jeong, Dongmin, Lee, Dong Gi, Choi, Jaehyuck, Cho, Sang Jin, Yu, Lan, Ahn, Jinho
• Format: Article
• Language: English
• Subjects: Dielectric films; Thin films
• ISSN: 2077-0375; 2077-0375
• DOI: 10.3390/membranes13080731

An extreme ultraviolet (EUV) pellicle is an ultrathin membrane at a stand-off distance from the reticle surface that protects the EUV mask from contamination during the exposure process. EUV pellicles must exhibit high EUV transmittance, low EUV reflectivity, and superior thermomechanical durability that can withstand the gradually increasing EUV source power. This study proposes an optimal range of optical constants to satisfy the EUV pellicle requirements based on the optical simulation results. Based on this, zirconium disilicide (ZrSi[sub.2]), which is expected to satisfy the optical and thermomechanical requirements, was selected as the EUV pellicle candidate material. An EUV pellicle composite comprising a ZrSi[sub.2] thin film deposited via co-sputtering was fabricated, and its thermal, optical, and mechanical properties were evaluated. The emissivity increased with an increase in the thickness of the ZrSi[sub.2] thin film. The measured EUV transmittance (92.7%) and reflectivity (0.033%) of the fabricated pellicle satisfied the EUV pellicle requirements. The ultimate tensile strength of the pellicle was 3.5 GPa. Thus, the applicability of the ZrSi[sub.2] thin film as an EUV pellicle material was verified.