Properties of nanostructured Al doped ZnO thin films grown by spray pyrolysis technique

Aluminium doped zinc oxide thin films were deposited on glass substrate by using spray pyrolysis technique. The X-ray diffraction study of the films revealed that the both the undoped and Al doped ZnO thin films exhibits hexagonal wurtzite structure. The preferred orientation is (002) for undoped an...

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Bibliographic Details
Published in:Semiconductors (Woodbury, N.Y.) N.Y.), 2014-08, Vol.48 (8), p.1023-1027
Main Authors: Kumar, N. Sadananda, Bangera, Kasturi V., Shivakumar, G. K.
Format: Article
Language:English
Subjects:
Aluminum
Analysis
Dielectric films
Diffraction
Electric properties
Interaction with Radiation
Magnetic Materials
Magnetism
Methods
Physics
Physics and Astronomy
Pyrolysis
Spectroscopy
Thin films
X-rays
Zinc oxide
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Summary:Aluminium doped zinc oxide thin films were deposited on glass substrate by using spray pyrolysis technique. The X-ray diffraction study of the films revealed that the both the undoped and Al doped ZnO thin films exhibits hexagonal wurtzite structure. The preferred orientation is (002) for undoped and up to 3 at % Al doping, further increase in the doping concentration to 5 at % changes the preferred orientation to (101) direction. The surface morphology of the films studied by scanning electron microscope, reveal marked changes on doping. Optical study indicates that both undoped and Al doped films are transparent in the visible region. The band gap of the films increased from 3.24 to 3.36 eV with increasing Al dopant concentration from 0 to 5 at % respectively. The Al doped films showed an increase in the conductivity by three orders of magnitude with increase in doping concentration. The maximum value of conductivity 106.3 S/cm is achieved for 3 at % Al doped films.
ISSN:1063-7826
1090-6479
DOI:10.1134/S106378261408017X