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Pattern transfer into low dielectric constant materials by high-density plasma etching
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Published in: | Solid state technology 2000-05, Vol.43 (5), p.125 |
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Format: | Magazinearticle |
Language: | English |
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container_issue | 5 |
container_start_page | 125 |
container_title | Solid state technology |
container_volume | 43 |
creator | Oehrlein, Gottlieb S Standaert, Theodorus E.F.M Matsuo, Peter J |
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format | magazinearticle |
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identifier | ISSN: 0038-111X |
ispartof | Solid state technology, 2000-05, Vol.43 (5), p.125 |
issn | 0038-111X |
language | eng |
recordid | cdi_gale_infotracmisc_A62451269 |
source | Business Source Ultimate |
subjects | Electronic components industry Materials |
title | Pattern transfer into low dielectric constant materials by high-density plasma etching |
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