Empirical-based modeling for control of CMP removal uniformity

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Bibliographic Details
Published in:Solid state technology 2001-06, Vol.44 (6), p.101
Main Authors: Jensen, Alan, Renteln, Peter, Jew, Stephen, Raeder, Chris, Cheung, Patrick
Format: Magazinearticle
Language:English
Subjects:
Analysis
Manufacturing processes
Production management
Semiconductor industry
Online Access:Get full text
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ISSN:0038-111X