CCD-controlled in situ interferometry for dry etch process monitoring

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Bibliographic Details
Published in:Solid state technology 2001-06, Vol.44 (6), p.117
Main Authors: John, Wilfred, Weixelbaum, Leonhard, Wittrich, Harald, Wurfl, Joachim, Frankowski, Gottfried
Format: Magazinearticle
Language:English
Subjects:
Etching reagents
Specialty chemicals industry
Online Access:Get full text
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ISSN:0038-111X