CCD-controlled in situ interferometry for dry etch process monitoring

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Published in:Solid state technology 2001-06, Vol.44 (6), p.117
Main Authors: John, Wilfred, Weixelbaum, Leonhard, Wittrich, Harald, Wurfl, Joachim, Frankowski, Gottfried
Format: Magazinearticle
Language:English
Subjects:
Etching reagents
Specialty chemicals industry
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container_issue 6
container_start_page 117
container_title Solid state technology
container_volume 44
creator John, Wilfred
Weixelbaum, Leonhard
Wittrich, Harald
Wurfl, Joachim
Frankowski, Gottfried
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format magazinearticle
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subjects Etching reagents
Specialty chemicals industry
title CCD-controlled in situ interferometry for dry etch process monitoring
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