Loading…

Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods

We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bit...

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 2010-07, Vol.518 (18), p.5311-5320
Main Authors: Didane, Y., Martini, C., Barret, M., Sanaur, S., Collot, P., Ackermann, J., Fages, F., Suzuki, A., Yoshimoto, N., Brisset, H., Videlot-Ackermann, C.
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83
cites cdi_FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83
container_end_page 5320
container_issue 18
container_start_page 5311
container_title Thin solid films
container_volume 518
creator Didane, Y.
Martini, C.
Barret, M.
Sanaur, S.
Collot, P.
Ackermann, J.
Fages, F.
Suzuki, A.
Yoshimoto, N.
Brisset, H.
Videlot-Ackermann, C.
description We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bithiophene DH- DS2T, was used as a hole transporting active layer. Structure and morphology of thin films have been studied by atomic force microscopy, X-ray diffraction and optical microscopy. Different parameters linked directly to the processes (solvent, concentration, deposition method, surface, post-treatment…) are identified as key factors controlling film quality/crystallinity and device performances. This systematic study reveals the factors that limit efficient charge transport at the macroscopic scale of the channel length in OTFT devices.
doi_str_mv 10.1016/j.tsf.2010.03.079
format article
fullrecord <record><control><sourceid>hal_cross</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_emse_00491467v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0040609010003901</els_id><sourcerecordid>oai_HAL_emse_00491467v1</sourcerecordid><originalsourceid>FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83</originalsourceid><addsrcrecordid>eNp9kMFu1DAQhi0EEkvhAbj5wgU1y9gO2VicqlVhkVbiAmfLdsbEqySOPOmqK_UFeBxehL5SXS3qsSePNd__W_4Yey9gLUA0nw7rhcJaQrmDWsNGv2Ar0W50JTdKvGQrgBqqBjS8Zm-IDgAgpFQrdrdN42xzpDTxFPhc-d5OEw58yXaiSEvKxJ0l7Hgh_v29vP9T9Xh7GqquLE-5DC4ufUxzjxPyOWNpK_ANxek3P5bmdEM8xGHkHc6J4hJLz4hLnzp6y14FOxC--39esF9fr39ud9X-x7fv26t95VUjl0p5DwLBKi2F0A6lk61Vra2drEG1qu50aDUigrZOf5ZWK9250EKohXOuVRfs47m3t4OZcxxtPplko9ld7Q2OhKbo0aJuNkdRYHGGfU5EGcNTQoB5dG0Oprg2j64NKFNcl8yHc2a25O0Qijsf6SkopW5USRbuy5nD8ttjxGzIR5w8djGjX0yX4jOvPAAXDJgV</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods</title><source>ScienceDirect Journals</source><creator>Didane, Y. ; Martini, C. ; Barret, M. ; Sanaur, S. ; Collot, P. ; Ackermann, J. ; Fages, F. ; Suzuki, A. ; Yoshimoto, N. ; Brisset, H. ; Videlot-Ackermann, C.</creator><creatorcontrib>Didane, Y. ; Martini, C. ; Barret, M. ; Sanaur, S. ; Collot, P. ; Ackermann, J. ; Fages, F. ; Suzuki, A. ; Yoshimoto, N. ; Brisset, H. ; Videlot-Ackermann, C.</creatorcontrib><description>We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bithiophene DH- DS2T, was used as a hole transporting active layer. Structure and morphology of thin films have been studied by atomic force microscopy, X-ray diffraction and optical microscopy. Different parameters linked directly to the processes (solvent, concentration, deposition method, surface, post-treatment…) are identified as key factors controlling film quality/crystallinity and device performances. This systematic study reveals the factors that limit efficient charge transport at the macroscopic scale of the channel length in OTFT devices.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2010.03.079</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Applied sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Electronic transport phenomena in thin films and low-dimensional structures ; Electronics ; Engineering Sciences ; Exact sciences and technology ; Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids) ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Micro and nanotechnologies ; Microelectronics ; Morphology ; Optical microscopy ; Organic semiconductor ; Physics ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Structure and morphology; thickness ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film ; Thin film structure and morphology ; Transistors ; Transport ; X-ray diffraction</subject><ispartof>Thin solid films, 2010-07, Vol.518 (18), p.5311-5320</ispartof><rights>2010 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83</citedby><cites>FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83</cites><orcidid>0000-0003-2013-0710 ; 0000-0001-8240-6474 ; 0000-0003-2586-3788 ; 0000-0003-1944-8457</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,777,781,882,27905,27906</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=22963016$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://hal-emse.ccsd.cnrs.fr/emse-00491467$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Didane, Y.</creatorcontrib><creatorcontrib>Martini, C.</creatorcontrib><creatorcontrib>Barret, M.</creatorcontrib><creatorcontrib>Sanaur, S.</creatorcontrib><creatorcontrib>Collot, P.</creatorcontrib><creatorcontrib>Ackermann, J.</creatorcontrib><creatorcontrib>Fages, F.</creatorcontrib><creatorcontrib>Suzuki, A.</creatorcontrib><creatorcontrib>Yoshimoto, N.</creatorcontrib><creatorcontrib>Brisset, H.</creatorcontrib><creatorcontrib>Videlot-Ackermann, C.</creatorcontrib><title>Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods</title><title>Thin solid films</title><description>We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bithiophene DH- DS2T, was used as a hole transporting active layer. Structure and morphology of thin films have been studied by atomic force microscopy, X-ray diffraction and optical microscopy. Different parameters linked directly to the processes (solvent, concentration, deposition method, surface, post-treatment…) are identified as key factors controlling film quality/crystallinity and device performances. This systematic study reveals the factors that limit efficient charge transport at the macroscopic scale of the channel length in OTFT devices.</description><subject>Applied sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Electronic transport phenomena in thin films and low-dimensional structures</subject><subject>Electronics</subject><subject>Engineering Sciences</subject><subject>Exact sciences and technology</subject><subject>Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Micro and nanotechnologies</subject><subject>Microelectronics</subject><subject>Morphology</subject><subject>Optical microscopy</subject><subject>Organic semiconductor</subject><subject>Physics</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Structure and morphology; thickness</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film</subject><subject>Thin film structure and morphology</subject><subject>Transistors</subject><subject>Transport</subject><subject>X-ray diffraction</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp9kMFu1DAQhi0EEkvhAbj5wgU1y9gO2VicqlVhkVbiAmfLdsbEqySOPOmqK_UFeBxehL5SXS3qsSePNd__W_4Yey9gLUA0nw7rhcJaQrmDWsNGv2Ar0W50JTdKvGQrgBqqBjS8Zm-IDgAgpFQrdrdN42xzpDTxFPhc-d5OEw58yXaiSEvKxJ0l7Hgh_v29vP9T9Xh7GqquLE-5DC4ufUxzjxPyOWNpK_ANxek3P5bmdEM8xGHkHc6J4hJLz4hLnzp6y14FOxC--39esF9fr39ud9X-x7fv26t95VUjl0p5DwLBKi2F0A6lk61Vra2drEG1qu50aDUigrZOf5ZWK9250EKohXOuVRfs47m3t4OZcxxtPplko9ld7Q2OhKbo0aJuNkdRYHGGfU5EGcNTQoB5dG0Oprg2j64NKFNcl8yHc2a25O0Qijsf6SkopW5USRbuy5nD8ttjxGzIR5w8djGjX0yX4jOvPAAXDJgV</recordid><startdate>20100701</startdate><enddate>20100701</enddate><creator>Didane, Y.</creator><creator>Martini, C.</creator><creator>Barret, M.</creator><creator>Sanaur, S.</creator><creator>Collot, P.</creator><creator>Ackermann, J.</creator><creator>Fages, F.</creator><creator>Suzuki, A.</creator><creator>Yoshimoto, N.</creator><creator>Brisset, H.</creator><creator>Videlot-Ackermann, C.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>1XC</scope><orcidid>https://orcid.org/0000-0003-2013-0710</orcidid><orcidid>https://orcid.org/0000-0001-8240-6474</orcidid><orcidid>https://orcid.org/0000-0003-2586-3788</orcidid><orcidid>https://orcid.org/0000-0003-1944-8457</orcidid></search><sort><creationdate>20100701</creationdate><title>Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods</title><author>Didane, Y. ; Martini, C. ; Barret, M. ; Sanaur, S. ; Collot, P. ; Ackermann, J. ; Fages, F. ; Suzuki, A. ; Yoshimoto, N. ; Brisset, H. ; Videlot-Ackermann, C.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Applied sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Electronic transport phenomena in thin films and low-dimensional structures</topic><topic>Electronics</topic><topic>Engineering Sciences</topic><topic>Exact sciences and technology</topic><topic>Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Micro and nanotechnologies</topic><topic>Microelectronics</topic><topic>Morphology</topic><topic>Optical microscopy</topic><topic>Organic semiconductor</topic><topic>Physics</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Structure and morphology; thickness</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film</topic><topic>Thin film structure and morphology</topic><topic>Transistors</topic><topic>Transport</topic><topic>X-ray diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Didane, Y.</creatorcontrib><creatorcontrib>Martini, C.</creatorcontrib><creatorcontrib>Barret, M.</creatorcontrib><creatorcontrib>Sanaur, S.</creatorcontrib><creatorcontrib>Collot, P.</creatorcontrib><creatorcontrib>Ackermann, J.</creatorcontrib><creatorcontrib>Fages, F.</creatorcontrib><creatorcontrib>Suzuki, A.</creatorcontrib><creatorcontrib>Yoshimoto, N.</creatorcontrib><creatorcontrib>Brisset, H.</creatorcontrib><creatorcontrib>Videlot-Ackermann, C.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Didane, Y.</au><au>Martini, C.</au><au>Barret, M.</au><au>Sanaur, S.</au><au>Collot, P.</au><au>Ackermann, J.</au><au>Fages, F.</au><au>Suzuki, A.</au><au>Yoshimoto, N.</au><au>Brisset, H.</au><au>Videlot-Ackermann, C.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods</atitle><jtitle>Thin solid films</jtitle><date>2010-07-01</date><risdate>2010</risdate><volume>518</volume><issue>18</issue><spage>5311</spage><epage>5320</epage><pages>5311-5320</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bithiophene DH- DS2T, was used as a hole transporting active layer. Structure and morphology of thin films have been studied by atomic force microscopy, X-ray diffraction and optical microscopy. Different parameters linked directly to the processes (solvent, concentration, deposition method, surface, post-treatment…) are identified as key factors controlling film quality/crystallinity and device performances. This systematic study reveals the factors that limit efficient charge transport at the macroscopic scale of the channel length in OTFT devices.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2010.03.079</doi><tpages>10</tpages><orcidid>https://orcid.org/0000-0003-2013-0710</orcidid><orcidid>https://orcid.org/0000-0001-8240-6474</orcidid><orcidid>https://orcid.org/0000-0003-2586-3788</orcidid><orcidid>https://orcid.org/0000-0003-1944-8457</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 0040-6090
ispartof Thin solid films, 2010-07, Vol.518 (18), p.5311-5320
issn 0040-6090
1879-2731
language eng
recordid cdi_hal_primary_oai_HAL_emse_00491467v1
source ScienceDirect Journals
subjects Applied sciences
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Electronic transport phenomena in thin films and low-dimensional structures
Electronics
Engineering Sciences
Exact sciences and technology
Liquid phase epitaxy
deposition from liquid phases (melts, solutions, and surface layers on liquids)
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Micro and nanotechnologies
Microelectronics
Morphology
Optical microscopy
Organic semiconductor
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film
Thin film structure and morphology
Transistors
Transport
X-ray diffraction
title Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T17%3A03%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-hal_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Comparison%20of%20p-channel%20transistors%20based%20on%20%CE%B1,%CF%89-hexyl-distyryl-bithiophene%20prepared%20using%20various%20film%20deposition%20methods&rft.jtitle=Thin%20solid%20films&rft.au=Didane,%20Y.&rft.date=2010-07-01&rft.volume=518&rft.issue=18&rft.spage=5311&rft.epage=5320&rft.pages=5311-5320&rft.issn=0040-6090&rft.eissn=1879-2731&rft.coden=THSFAP&rft_id=info:doi/10.1016/j.tsf.2010.03.079&rft_dat=%3Chal_cross%3Eoai_HAL_emse_00491467v1%3C/hal_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true