Loading…
Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods
We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bit...
Saved in:
Published in: | Thin solid films 2010-07, Vol.518 (18), p.5311-5320 |
---|---|
Main Authors: | , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83 |
---|---|
cites | cdi_FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83 |
container_end_page | 5320 |
container_issue | 18 |
container_start_page | 5311 |
container_title | Thin solid films |
container_volume | 518 |
creator | Didane, Y. Martini, C. Barret, M. Sanaur, S. Collot, P. Ackermann, J. Fages, F. Suzuki, A. Yoshimoto, N. Brisset, H. Videlot-Ackermann, C. |
description | We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bithiophene
DH-
DS2T, was used as a hole transporting active layer. Structure and morphology of thin films have been studied by atomic force microscopy, X-ray diffraction and optical microscopy. Different parameters linked directly to the processes (solvent, concentration, deposition method, surface, post-treatment…) are identified as key factors controlling film quality/crystallinity and device performances. This systematic study reveals the factors that limit efficient charge transport at the macroscopic scale of the channel length in OTFT devices. |
doi_str_mv | 10.1016/j.tsf.2010.03.079 |
format | article |
fullrecord | <record><control><sourceid>hal_cross</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_emse_00491467v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0040609010003901</els_id><sourcerecordid>oai_HAL_emse_00491467v1</sourcerecordid><originalsourceid>FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83</originalsourceid><addsrcrecordid>eNp9kMFu1DAQhi0EEkvhAbj5wgU1y9gO2VicqlVhkVbiAmfLdsbEqySOPOmqK_UFeBxehL5SXS3qsSePNd__W_4Yey9gLUA0nw7rhcJaQrmDWsNGv2Ar0W50JTdKvGQrgBqqBjS8Zm-IDgAgpFQrdrdN42xzpDTxFPhc-d5OEw58yXaiSEvKxJ0l7Hgh_v29vP9T9Xh7GqquLE-5DC4ufUxzjxPyOWNpK_ANxek3P5bmdEM8xGHkHc6J4hJLz4hLnzp6y14FOxC--39esF9fr39ud9X-x7fv26t95VUjl0p5DwLBKi2F0A6lk61Vra2drEG1qu50aDUigrZOf5ZWK9250EKohXOuVRfs47m3t4OZcxxtPplko9ld7Q2OhKbo0aJuNkdRYHGGfU5EGcNTQoB5dG0Oprg2j64NKFNcl8yHc2a25O0Qijsf6SkopW5USRbuy5nD8ttjxGzIR5w8djGjX0yX4jOvPAAXDJgV</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods</title><source>ScienceDirect Journals</source><creator>Didane, Y. ; Martini, C. ; Barret, M. ; Sanaur, S. ; Collot, P. ; Ackermann, J. ; Fages, F. ; Suzuki, A. ; Yoshimoto, N. ; Brisset, H. ; Videlot-Ackermann, C.</creator><creatorcontrib>Didane, Y. ; Martini, C. ; Barret, M. ; Sanaur, S. ; Collot, P. ; Ackermann, J. ; Fages, F. ; Suzuki, A. ; Yoshimoto, N. ; Brisset, H. ; Videlot-Ackermann, C.</creatorcontrib><description>We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bithiophene
DH-
DS2T, was used as a hole transporting active layer. Structure and morphology of thin films have been studied by atomic force microscopy, X-ray diffraction and optical microscopy. Different parameters linked directly to the processes (solvent, concentration, deposition method, surface, post-treatment…) are identified as key factors controlling film quality/crystallinity and device performances. This systematic study reveals the factors that limit efficient charge transport at the macroscopic scale of the channel length in OTFT devices.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2010.03.079</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Applied sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Electronic transport phenomena in thin films and low-dimensional structures ; Electronics ; Engineering Sciences ; Exact sciences and technology ; Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids) ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Micro and nanotechnologies ; Microelectronics ; Morphology ; Optical microscopy ; Organic semiconductor ; Physics ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Structure and morphology; thickness ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film ; Thin film structure and morphology ; Transistors ; Transport ; X-ray diffraction</subject><ispartof>Thin solid films, 2010-07, Vol.518 (18), p.5311-5320</ispartof><rights>2010 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83</citedby><cites>FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83</cites><orcidid>0000-0003-2013-0710 ; 0000-0001-8240-6474 ; 0000-0003-2586-3788 ; 0000-0003-1944-8457</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,777,781,882,27905,27906</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=22963016$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://hal-emse.ccsd.cnrs.fr/emse-00491467$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Didane, Y.</creatorcontrib><creatorcontrib>Martini, C.</creatorcontrib><creatorcontrib>Barret, M.</creatorcontrib><creatorcontrib>Sanaur, S.</creatorcontrib><creatorcontrib>Collot, P.</creatorcontrib><creatorcontrib>Ackermann, J.</creatorcontrib><creatorcontrib>Fages, F.</creatorcontrib><creatorcontrib>Suzuki, A.</creatorcontrib><creatorcontrib>Yoshimoto, N.</creatorcontrib><creatorcontrib>Brisset, H.</creatorcontrib><creatorcontrib>Videlot-Ackermann, C.</creatorcontrib><title>Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods</title><title>Thin solid films</title><description>We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bithiophene
DH-
DS2T, was used as a hole transporting active layer. Structure and morphology of thin films have been studied by atomic force microscopy, X-ray diffraction and optical microscopy. Different parameters linked directly to the processes (solvent, concentration, deposition method, surface, post-treatment…) are identified as key factors controlling film quality/crystallinity and device performances. This systematic study reveals the factors that limit efficient charge transport at the macroscopic scale of the channel length in OTFT devices.</description><subject>Applied sciences</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Electronic transport phenomena in thin films and low-dimensional structures</subject><subject>Electronics</subject><subject>Engineering Sciences</subject><subject>Exact sciences and technology</subject><subject>Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Micro and nanotechnologies</subject><subject>Microelectronics</subject><subject>Morphology</subject><subject>Optical microscopy</subject><subject>Organic semiconductor</subject><subject>Physics</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Structure and morphology; thickness</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film</subject><subject>Thin film structure and morphology</subject><subject>Transistors</subject><subject>Transport</subject><subject>X-ray diffraction</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNp9kMFu1DAQhi0EEkvhAbj5wgU1y9gO2VicqlVhkVbiAmfLdsbEqySOPOmqK_UFeBxehL5SXS3qsSePNd__W_4Yey9gLUA0nw7rhcJaQrmDWsNGv2Ar0W50JTdKvGQrgBqqBjS8Zm-IDgAgpFQrdrdN42xzpDTxFPhc-d5OEw58yXaiSEvKxJ0l7Hgh_v29vP9T9Xh7GqquLE-5DC4ufUxzjxPyOWNpK_ANxek3P5bmdEM8xGHkHc6J4hJLz4hLnzp6y14FOxC--39esF9fr39ud9X-x7fv26t95VUjl0p5DwLBKi2F0A6lk61Vra2drEG1qu50aDUigrZOf5ZWK9250EKohXOuVRfs47m3t4OZcxxtPplko9ld7Q2OhKbo0aJuNkdRYHGGfU5EGcNTQoB5dG0Oprg2j64NKFNcl8yHc2a25O0Qijsf6SkopW5USRbuy5nD8ttjxGzIR5w8djGjX0yX4jOvPAAXDJgV</recordid><startdate>20100701</startdate><enddate>20100701</enddate><creator>Didane, Y.</creator><creator>Martini, C.</creator><creator>Barret, M.</creator><creator>Sanaur, S.</creator><creator>Collot, P.</creator><creator>Ackermann, J.</creator><creator>Fages, F.</creator><creator>Suzuki, A.</creator><creator>Yoshimoto, N.</creator><creator>Brisset, H.</creator><creator>Videlot-Ackermann, C.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>1XC</scope><orcidid>https://orcid.org/0000-0003-2013-0710</orcidid><orcidid>https://orcid.org/0000-0001-8240-6474</orcidid><orcidid>https://orcid.org/0000-0003-2586-3788</orcidid><orcidid>https://orcid.org/0000-0003-1944-8457</orcidid></search><sort><creationdate>20100701</creationdate><title>Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods</title><author>Didane, Y. ; Martini, C. ; Barret, M. ; Sanaur, S. ; Collot, P. ; Ackermann, J. ; Fages, F. ; Suzuki, A. ; Yoshimoto, N. ; Brisset, H. ; Videlot-Ackermann, C.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Applied sciences</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Electronic transport phenomena in thin films and low-dimensional structures</topic><topic>Electronics</topic><topic>Engineering Sciences</topic><topic>Exact sciences and technology</topic><topic>Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Micro and nanotechnologies</topic><topic>Microelectronics</topic><topic>Morphology</topic><topic>Optical microscopy</topic><topic>Organic semiconductor</topic><topic>Physics</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Structure and morphology; thickness</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film</topic><topic>Thin film structure and morphology</topic><topic>Transistors</topic><topic>Transport</topic><topic>X-ray diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Didane, Y.</creatorcontrib><creatorcontrib>Martini, C.</creatorcontrib><creatorcontrib>Barret, M.</creatorcontrib><creatorcontrib>Sanaur, S.</creatorcontrib><creatorcontrib>Collot, P.</creatorcontrib><creatorcontrib>Ackermann, J.</creatorcontrib><creatorcontrib>Fages, F.</creatorcontrib><creatorcontrib>Suzuki, A.</creatorcontrib><creatorcontrib>Yoshimoto, N.</creatorcontrib><creatorcontrib>Brisset, H.</creatorcontrib><creatorcontrib>Videlot-Ackermann, C.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Didane, Y.</au><au>Martini, C.</au><au>Barret, M.</au><au>Sanaur, S.</au><au>Collot, P.</au><au>Ackermann, J.</au><au>Fages, F.</au><au>Suzuki, A.</au><au>Yoshimoto, N.</au><au>Brisset, H.</au><au>Videlot-Ackermann, C.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods</atitle><jtitle>Thin solid films</jtitle><date>2010-07-01</date><risdate>2010</risdate><volume>518</volume><issue>18</issue><spage>5311</spage><epage>5320</epage><pages>5311-5320</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>We present a series of organic thin film transistor (OTFT) devices realized by vacuum evaporation, spin-coating, drop casting and inkjet printing and a comparative analysis of their electrical response/behavior obtained under identical measurement conditions. A small molecule, α,ω-hexyl-distyryl-bithiophene
DH-
DS2T, was used as a hole transporting active layer. Structure and morphology of thin films have been studied by atomic force microscopy, X-ray diffraction and optical microscopy. Different parameters linked directly to the processes (solvent, concentration, deposition method, surface, post-treatment…) are identified as key factors controlling film quality/crystallinity and device performances. This systematic study reveals the factors that limit efficient charge transport at the macroscopic scale of the channel length in OTFT devices.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2010.03.079</doi><tpages>10</tpages><orcidid>https://orcid.org/0000-0003-2013-0710</orcidid><orcidid>https://orcid.org/0000-0001-8240-6474</orcidid><orcidid>https://orcid.org/0000-0003-2586-3788</orcidid><orcidid>https://orcid.org/0000-0003-1944-8457</orcidid></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0040-6090 |
ispartof | Thin solid films, 2010-07, Vol.518 (18), p.5311-5320 |
issn | 0040-6090 1879-2731 |
language | eng |
recordid | cdi_hal_primary_oai_HAL_emse_00491467v1 |
source | ScienceDirect Journals |
subjects | Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport phenomena in thin films and low-dimensional structures Electronics Engineering Sciences Exact sciences and technology Liquid phase epitaxy deposition from liquid phases (melts, solutions, and surface layers on liquids) Materials science Methods of deposition of films and coatings film growth and epitaxy Micro and nanotechnologies Microelectronics Morphology Optical microscopy Organic semiconductor Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film Thin film structure and morphology Transistors Transport X-ray diffraction |
title | Comparison of p-channel transistors based on α,ω-hexyl-distyryl-bithiophene prepared using various film deposition methods |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T17%3A03%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-hal_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Comparison%20of%20p-channel%20transistors%20based%20on%20%CE%B1,%CF%89-hexyl-distyryl-bithiophene%20prepared%20using%20various%20film%20deposition%20methods&rft.jtitle=Thin%20solid%20films&rft.au=Didane,%20Y.&rft.date=2010-07-01&rft.volume=518&rft.issue=18&rft.spage=5311&rft.epage=5320&rft.pages=5311-5320&rft.issn=0040-6090&rft.eissn=1879-2731&rft.coden=THSFAP&rft_id=info:doi/10.1016/j.tsf.2010.03.079&rft_dat=%3Chal_cross%3Eoai_HAL_emse_00491467v1%3C/hal_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c362t-3cc01e0a392119be2b28a38a4b2403834d9f89eee09ab952a939dbf80f41bbb83%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |