Influence of sputtering conditions on ionic conductivity of LiPON thin films

LiPON films were deposited using radio-frequency magnetron sputtering in a pure N 2 gas atmosphere. The influence of rf power, N 2 pressure, target–substrate distance and target density on thin film composition and ionic conductivity has been studied. Impedance measurements performed between 25 and...

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Published in:Solid state ionics 2006-01, Vol.177 (3), p.257-261
Main Authors: Hamon, Y., Douard, A., Sabary, F., Marcel, C., Vinatier, P., Pecquenard, B., Levasseur, A.
Format: Article
Language:English
Subjects:
Chemical Sciences
Ionic conductivity
Material chemistry
Solid electrolyte
Sputtering target density
Thin films
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container_title Solid state ionics
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description LiPON films were deposited using radio-frequency magnetron sputtering in a pure N 2 gas atmosphere. The influence of rf power, N 2 pressure, target–substrate distance and target density on thin film composition and ionic conductivity has been studied. Impedance measurements performed between 25 and 80 °C have indicated that ionic conductivity increases with nitrogen incorporation into the glass structure. An increase in the deposition rate with the target density has also been observed.
doi_str_mv 10.1016/j.ssi.2005.10.021
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subjects Chemical Sciences
Ionic conductivity
Material chemistry
Solid electrolyte
Sputtering target density
Thin films
title Influence of sputtering conditions on ionic conductivity of LiPON thin films
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