Smallest lithographic marks generated by optical focusing systems

We show that the combination of Bessel beams and photosensitive materials exhibiting polarization filtering properties allows one to reach the smallest mark that can be lithographically generated by focusing systems. This property is of interest in current optical data storage techniques.

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Bibliographic Details
Published in:Optics letters 2007-04, Vol.32 (8), p.976-978
Main Authors: GROSJEAN, T, COURJON, D, BAINIER, C
Format: Article
Language:English
Subjects:
Engineering Sciences
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Optical computers, logic elements, interconnects, switches
neural networks
Optical elements, devices, and systems
Optics
Photonic
Physics
Polarization
Wave optics
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Description
Summary:We show that the combination of Bessel beams and photosensitive materials exhibiting polarization filtering properties allows one to reach the smallest mark that can be lithographically generated by focusing systems. This property is of interest in current optical data storage techniques.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.32.000976