Self-assembled block polymer templates as high resolution lithographic masks

Diblock copolymer thin films have recently received more attention due to their ability to organize into nanometric structures under thermal annealing. This phenomenon was studied for an asymmetric poly(styrene- block-methyl methacrylate) (PS- b-PMMA) diblock copolymer with PMMA weight fraction of 0...

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Bibliographic Details
Published in:Surface science 2007-07, Vol.601 (13), p.2611-2614
Main Authors: Aissou, K., Kogelschatz, M., Baron, T., Gentile, P.
Format: Article
Language:English
Subjects:
Block copolymer
Chemical and Process Engineering
Chemical Sciences
Condensed Matter
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Defects
Engineering Sciences
Etching
Exact sciences and technology
Materials Science
Micro and nanotechnologies
Microelectronics
Nanostructures
Physics
Polymers
Self-assembly
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Description
Summary:Diblock copolymer thin films have recently received more attention due to their ability to organize into nanometric structures under thermal annealing. This phenomenon was studied for an asymmetric poly(styrene- block-methyl methacrylate) (PS- b-PMMA) diblock copolymer with PMMA weight fraction of 0.3 and MW = 67,100 g mol −1. First, the surface chemistry of the substrate was modified to favor the formation of vertical PMMA cylinders surrounded by a PS matrix. We have also found that the mean pore area of cylinders increases with their coordination number. Finally, these films were used as a deposition or etching mask to produce well-organized arrays of holes, dots and nanopillars.
ISSN:0039-6028
1879-2758
DOI:10.1016/j.susc.2006.12.017