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Self-assembled block polymer templates as high resolution lithographic masks
Diblock copolymer thin films have recently received more attention due to their ability to organize into nanometric structures under thermal annealing. This phenomenon was studied for an asymmetric poly(styrene- block-methyl methacrylate) (PS- b-PMMA) diblock copolymer with PMMA weight fraction of 0...
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| Published in: | Surface science 2007-07, Vol.601 (13), p.2611-2614 |
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| Main Authors: | , , , |
| Format: | Article |
| Language: | English |
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| cites | cdi_FETCH-LOGICAL-c426t-c895919163f1ca035fb498838d5a35204fd5c50dcc33314f9c42f93e45a9dd8c3 |
| container_end_page | 2614 |
| container_issue | 13 |
| container_start_page | 2611 |
| container_title | Surface science |
| container_volume | 601 |
| creator | Aissou, K. Kogelschatz, M. Baron, T. Gentile, P. |
| description | Diblock copolymer thin films have recently received more attention due to their ability to organize into nanometric structures under thermal annealing. This phenomenon was studied for an asymmetric poly(styrene-
block-methyl methacrylate) (PS-
b-PMMA) diblock copolymer with PMMA weight fraction of 0.3 and MW
=
67,100
g
mol
−1. First, the surface chemistry of the substrate was modified to favor the formation of vertical PMMA cylinders surrounded by a PS matrix. We have also found that the mean pore area of cylinders increases with their coordination number. Finally, these films were used as a deposition or etching mask to produce well-organized arrays of holes, dots and nanopillars. |
| doi_str_mv | 10.1016/j.susc.2006.12.017 |
| format | article |
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block-methyl methacrylate) (PS-
b-PMMA) diblock copolymer with PMMA weight fraction of 0.3 and MW
=
67,100
g
mol
−1. First, the surface chemistry of the substrate was modified to favor the formation of vertical PMMA cylinders surrounded by a PS matrix. We have also found that the mean pore area of cylinders increases with their coordination number. Finally, these films were used as a deposition or etching mask to produce well-organized arrays of holes, dots and nanopillars.</description><identifier>ISSN: 0039-6028</identifier><identifier>EISSN: 1879-2758</identifier><identifier>DOI: 10.1016/j.susc.2006.12.017</identifier><identifier>CODEN: SUSCAS</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Block copolymer ; Chemical and Process Engineering ; Chemical Sciences ; Condensed Matter ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Defects ; Engineering Sciences ; Etching ; Exact sciences and technology ; Materials Science ; Micro and nanotechnologies ; Microelectronics ; Nanostructures ; Physics ; Polymers ; Self-assembly</subject><ispartof>Surface science, 2007-07, Vol.601 (13), p.2611-2614</ispartof><rights>2007 Elsevier B.V.</rights><rights>2007 INIST-CNRS</rights><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c426t-c895919163f1ca035fb498838d5a35204fd5c50dcc33314f9c42f93e45a9dd8c3</citedby><cites>FETCH-LOGICAL-c426t-c895919163f1ca035fb498838d5a35204fd5c50dcc33314f9c42f93e45a9dd8c3</cites><orcidid>0000-0002-1547-4247 ; 0000-0001-5005-6596</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,309,310,314,780,784,789,790,885,23930,23931,25140,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=18925698$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://hal.science/hal-00394759$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Aissou, K.</creatorcontrib><creatorcontrib>Kogelschatz, M.</creatorcontrib><creatorcontrib>Baron, T.</creatorcontrib><creatorcontrib>Gentile, P.</creatorcontrib><title>Self-assembled block polymer templates as high resolution lithographic masks</title><title>Surface science</title><description>Diblock copolymer thin films have recently received more attention due to their ability to organize into nanometric structures under thermal annealing. This phenomenon was studied for an asymmetric poly(styrene-
block-methyl methacrylate) (PS-
b-PMMA) diblock copolymer with PMMA weight fraction of 0.3 and MW
=
67,100
g
mol
−1. First, the surface chemistry of the substrate was modified to favor the formation of vertical PMMA cylinders surrounded by a PS matrix. We have also found that the mean pore area of cylinders increases with their coordination number. Finally, these films were used as a deposition or etching mask to produce well-organized arrays of holes, dots and nanopillars.</description><subject>Block copolymer</subject><subject>Chemical and Process Engineering</subject><subject>Chemical Sciences</subject><subject>Condensed Matter</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Defects</subject><subject>Engineering Sciences</subject><subject>Etching</subject><subject>Exact sciences and technology</subject><subject>Materials Science</subject><subject>Micro and nanotechnologies</subject><subject>Microelectronics</subject><subject>Nanostructures</subject><subject>Physics</subject><subject>Polymers</subject><subject>Self-assembly</subject><issn>0039-6028</issn><issn>1879-2758</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNqNkU1r3DAQhkVpodu0f6AnXxrowY4-LK8EuYSQJoGFHNqehVYexdrIK0fjDeTfV2ZDciuZy8DwvPP1EvKd0YZR1p3tGjygazilXcN4Q9n6A1kxtdY1X0v1kawoFbruKFefyRfEHS3Rarkim98QfW0RYdxG6KttTO6hmlJ8HiFXM4xTtDNgZbEawv1QZcAUD3NI-yqGeUj32U5DcNVo8QG_kk_eRoRvL_mE_P119efypt7cXd9eXmxq1_Jurp3SUjPNOuGZs1RIv221UkL10grJaet76STtnRNCsNbrIvNaQCut7nvlxAn5eew72GimHEabn02ywdxcbMxSW65t11I_scKeHtkpp8cD4GzGgA5itHtIBzRclxCavgdUVLWigPwIupwQM_jXFRg1ixtmZxY3zOKGYdwUN4rox0t3i85Gn-3eBXxTKs1lp1Xhzo8clP89BcgGXYC9gz5kcLPpU_jfmH8hZJ-2</recordid><startdate>20070701</startdate><enddate>20070701</enddate><creator>Aissou, K.</creator><creator>Kogelschatz, M.</creator><creator>Baron, T.</creator><creator>Gentile, P.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>7SR</scope><scope>8BQ</scope><scope>JG9</scope><scope>1XC</scope><orcidid>https://orcid.org/0000-0002-1547-4247</orcidid><orcidid>https://orcid.org/0000-0001-5005-6596</orcidid></search><sort><creationdate>20070701</creationdate><title>Self-assembled block polymer templates as high resolution lithographic masks</title><author>Aissou, K. ; Kogelschatz, M. ; Baron, T. ; Gentile, P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c426t-c895919163f1ca035fb498838d5a35204fd5c50dcc33314f9c42f93e45a9dd8c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Block copolymer</topic><topic>Chemical and Process Engineering</topic><topic>Chemical Sciences</topic><topic>Condensed Matter</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Defects</topic><topic>Engineering Sciences</topic><topic>Etching</topic><topic>Exact sciences and technology</topic><topic>Materials Science</topic><topic>Micro and nanotechnologies</topic><topic>Microelectronics</topic><topic>Nanostructures</topic><topic>Physics</topic><topic>Polymers</topic><topic>Self-assembly</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Aissou, K.</creatorcontrib><creatorcontrib>Kogelschatz, M.</creatorcontrib><creatorcontrib>Baron, T.</creatorcontrib><creatorcontrib>Gentile, P.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Materials Research Database</collection><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Aissou, K.</au><au>Kogelschatz, M.</au><au>Baron, T.</au><au>Gentile, P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Self-assembled block polymer templates as high resolution lithographic masks</atitle><jtitle>Surface science</jtitle><date>2007-07-01</date><risdate>2007</risdate><volume>601</volume><issue>13</issue><spage>2611</spage><epage>2614</epage><pages>2611-2614</pages><issn>0039-6028</issn><eissn>1879-2758</eissn><coden>SUSCAS</coden><abstract>Diblock copolymer thin films have recently received more attention due to their ability to organize into nanometric structures under thermal annealing. This phenomenon was studied for an asymmetric poly(styrene-
block-methyl methacrylate) (PS-
b-PMMA) diblock copolymer with PMMA weight fraction of 0.3 and MW
=
67,100
g
mol
−1. First, the surface chemistry of the substrate was modified to favor the formation of vertical PMMA cylinders surrounded by a PS matrix. We have also found that the mean pore area of cylinders increases with their coordination number. Finally, these films were used as a deposition or etching mask to produce well-organized arrays of holes, dots and nanopillars.</abstract><cop>Lausanne</cop><cop>Amsterdam</cop><cop>New York, NY</cop><pub>Elsevier B.V</pub><doi>10.1016/j.susc.2006.12.017</doi><tpages>4</tpages><orcidid>https://orcid.org/0000-0002-1547-4247</orcidid><orcidid>https://orcid.org/0000-0001-5005-6596</orcidid></addata></record> |
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| identifier | ISSN: 0039-6028 |
| ispartof | Surface science, 2007-07, Vol.601 (13), p.2611-2614 |
| issn | 0039-6028 1879-2758 |
| language | eng |
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| source | Elsevier |
| subjects | Block copolymer Chemical and Process Engineering Chemical Sciences Condensed Matter Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Defects Engineering Sciences Etching Exact sciences and technology Materials Science Micro and nanotechnologies Microelectronics Nanostructures Physics Polymers Self-assembly |
| title | Self-assembled block polymer templates as high resolution lithographic masks |
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