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Dependence of ZnO:Al properties on the substrate to target position in RF sputtering
Al doped ZnO (ZnO:Al) is commonly used as front contact in Cu(In,Ga)Se 2 based thin film solar cells, and for this application is often deposited by RF magnetron sputtering from a ceramic target. In the present study, we use a configuration in which the substrates are immobile under the sputter targ...
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Published in: | Thin solid films 2008-08, Vol.516 (20), p.7094-7097 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Al doped ZnO (ZnO:Al) is commonly used as front contact in Cu(In,Ga)Se
2 based thin film solar cells, and for this application is often deposited by RF magnetron sputtering from a ceramic target. In the present study, we use a configuration in which the substrates are immobile under the sputter target and we find the ZnO:Al film properties to depend strongly on the substrate position relative to the target erosion area (or “racetrack”). The zone immediately under the racetrack has higher resistivity correlated to a lesser crystallinity. The differences between these zones (inside the racetrack, under the racetrack, outside the racetrack) are studied as a function of the substrate: bare soda-lime glass (SLG), (CBD)CdS coated SLG, undoped ZnO coated SLG. It is shown that the evolution of the ZnO:Al films non homogeneity is substrate dependent. The impact on complete CIGSe/CdS/ZnO/ZnO:Al devices is measured and show that the influence of the substrates has to be taking in account; the device prediction made from models using the ZnO:Al properties measured on bare glass are inaccurate. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2007.12.053 |