Side wall restoration of porous ultra low k dielectrics for sub-45 nm technology nodes

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Bibliographic Details
Published in:Microelectronic engineering 2007, Vol.84, p.2595-2599
Main Authors: Chaabouni, H., Chapelon, L.L., Aimadeddine, M., Vitiello, J., Farcy, A., Delsol, R., Brun, P., Fossati, D., Arnal, V., Chevolleau, T., Joubert, O., Torres, J.
Format: Article
Language:English
Online Access:Get full text
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ISSN:0167-9317
1873-5568