Study of mechanisms involved in photoresist microlens formation

The mechanisms involved in photoresist microlens formation are investigated in order to understand the lack of sphericity of certain experimental microlenses. A characterization of the resist rheological properties has enabled to demonstrate that there is a competition between surface tensions and r...

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Bibliographic Details
Published in:Microelectronic engineering 2006-04, Vol.83 (4), p.1087-1090
Main Authors: Audran, S., Faure, B., Mortini, B., Regolini, J., Schlatter, G., Hadziioannou, G.
Format: Article
Language:English
Subjects:
Applied sciences
Chemical Sciences
Crosslinking
Design. Technologies. Operation analysis. Testing
Electronics
Exact sciences and technology
Integrated circuits
Microelectronic fabrication (materials and surfaces technology)
Microlens
Polymers
Reflow method
Rheological properties
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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Summary:The mechanisms involved in photoresist microlens formation are investigated in order to understand the lack of sphericity of certain experimental microlenses. A characterization of the resist rheological properties has enabled to demonstrate that there is a competition between surface tensions and resist crosslinking reaction during the final process bake. Depending on the process conditions, the crosslinking reaction kinetics dominate and prevent the correct formation of the microlens.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2006.01.150