High frequency performance of sub-100 nm UTB-FDSOI featuring TiN/HfO2 gate stack

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Bibliographic Details
Published in:Solid-state electronics 2009-04, Vol.53, p.433-437
Main Authors: Lim, T.C., Rozeau, O., Buj, C., Paccaud, M., Lepilliet, Sylvie, Dambrine, Gilles, Danneville, Francois
Format: Article
Language:English
Online Access:Get full text
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ISSN:0038-1101
DOI:10.1016/j.sse.2008.09.022