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On the structure and composition of nanoscale TiAlN/VN multilayers

The chemical and physical structure of a TiAlN/VN multilayer, of average layer thickness 3.4 ± 0.4 nm, was characterized using a spherical aberration-corrected STEM, utilizing a nominal 0.1-nm beam, by HAADF and EELS. The interface between layers was shown to be rough, with local thickness variation...

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Bibliographic Details
Published in:Philosophical magazine (Abingdon, England) England), 2007-02, Vol.87 (6), p.967-978
Main Authors: Zhou, Z., Rainforth, W. M., Falke, U., Falke, M., Bleloch, A., Hovsepian, P. E.
Format: Article
Language:English
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Summary:The chemical and physical structure of a TiAlN/VN multilayer, of average layer thickness 3.4 ± 0.4 nm, was characterized using a spherical aberration-corrected STEM, utilizing a nominal 0.1-nm beam, by HAADF and EELS. The interface between layers was shown to be rough, with local thickness variations evident in layer thickness. Chemical mixing between layers was identified, consistent with numerical modelling of the deposition flux and layer growth. The implications of the compositional modulation are discussed.
ISSN:1478-6435
1478-6443
1478-6433
DOI:10.1080/14786430601019433