Gas-liquid selective oxidations with oxygen under explosive conditions in a micro-structured reactor

The gas-liquid oxidation of cyclohexane is performed at high temperature (>200 degrees C) and pressure (up to 25 bar) using pure oxygen in a Pyrex capped silicon etched microreactor which allows convenient screen reaction conditions well above the flammability limit.

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Bibliographic Details
Published in:Lab on a chip 2008-01, Vol.8 (5), p.814-817
Main Authors: Leclerc, Arnaud, Alamé, Mohamad, Schweich, Daniel, Pouteau, Patrick, Delattre, Cyril, de Bellefon, Claude
Format: Article
Language:English
Subjects:
Chemical engineering
Chemical Sciences
Cyclohexanes - chemistry
Explosive Agents - chemistry
Gases - chemistry
Ligands
Microfluidic Analytical Techniques - instrumentation
Microfluidic Analytical Techniques - methods
Molecular Structure
Oxidation-Reduction
Oxygen - chemistry
Particle Size
Pressure
Sensitivity and Specificity
Silicon - chemistry
Temperature
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Description
Summary:The gas-liquid oxidation of cyclohexane is performed at high temperature (>200 degrees C) and pressure (up to 25 bar) using pure oxygen in a Pyrex capped silicon etched microreactor which allows convenient screen reaction conditions well above the flammability limit.
ISSN:1473-0197
1473-0189
DOI:10.1039/b717985e