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Laterally organized carbon nanotube arrays based on hot-filament chemical vapor deposition
Lateral porous anodic alumina (PAA) templates were used to organize carbon nanotubes (CNTs) grown by a hot-filament assisted chemical vapor deposition (HFCVD) process. For the CNT growth, we used a modified “home-made” HFCVD system with two independently powered filaments which are fitted respective...
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| Published in: | Thin solid films 2011-05, Vol.519 (14), p.4598-4602 |
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| Main Authors: | , , , , |
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| container_end_page | 4602 |
| container_issue | 14 |
| container_start_page | 4598 |
| container_title | Thin solid films |
| container_volume | 519 |
| creator | Kim, Ki-Hwan Lefeuvre, Emmanuel Châtelet, Marc Pribat, Didier Cojocaru, Costel Sorin |
| description | Lateral porous anodic alumina (PAA) templates were used to organize carbon nanotubes (CNTs) grown by a hot-filament assisted chemical vapor deposition (HFCVD) process. For the CNT growth, we used a modified “home-made” HFCVD system with two independently powered filaments which are fitted respectively on the methane (CH
4) gas line, which serves as a carbon precursor and on the hydrogen (H
2) gas line, which acts as an etching agent for the parasitic amorphous carbon. Various activation powers of the hot filaments were used to directly or indirectly decompose the gas mixtures at relatively low substrate temperatures. A parametric study of the HFCVD process has been carried out for optimizing the confined CNTs growth inside the lateral PAA templates. |
| doi_str_mv | 10.1016/j.tsf.2011.01.334 |
| format | article |
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4) gas line, which serves as a carbon precursor and on the hydrogen (H
2) gas line, which acts as an etching agent for the parasitic amorphous carbon. Various activation powers of the hot filaments were used to directly or indirectly decompose the gas mixtures at relatively low substrate temperatures. A parametric study of the HFCVD process has been carried out for optimizing the confined CNTs growth inside the lateral PAA templates.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2011.01.334</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Aluminum oxide ; Anodic ; Arrays ; Carbon ; Carbon nanotubes ; Chemical vapor deposition ; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) ; Condensed Matter ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Filaments ; Hot-filament chemical vapor deposition ; Materials Science ; Methane ; Methods of deposition of films and coatings; film growth and epitaxy ; Methods of nanofabrication ; Nanoscale materials and structures: fabrication and characterization ; Nanotubes ; Other topics in nanoscale materials and structures ; Physics ; Porous anodic alumina</subject><ispartof>Thin solid films, 2011-05, Vol.519 (14), p.4598-4602</ispartof><rights>2011 Elsevier B.V.</rights><rights>2015 INIST-CNRS</rights><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c437t-30404472c38148947dfc1b622f369bd7b4d91dbdb451e7ed84a44a4d879b4d583</citedby><cites>FETCH-LOGICAL-c437t-30404472c38148947dfc1b622f369bd7b4d91dbdb451e7ed84a44a4d879b4d583</cites><orcidid>0000-0002-9601-4647 ; 0000-0002-5539-2051</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,309,310,314,776,780,785,786,881,23910,23911,25119,27903,27904</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=24393150$$DView record in Pascal Francis$$Hfree_for_read</backlink><backlink>$$Uhttps://hal.science/hal-00794039$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Kim, Ki-Hwan</creatorcontrib><creatorcontrib>Lefeuvre, Emmanuel</creatorcontrib><creatorcontrib>Châtelet, Marc</creatorcontrib><creatorcontrib>Pribat, Didier</creatorcontrib><creatorcontrib>Cojocaru, Costel Sorin</creatorcontrib><title>Laterally organized carbon nanotube arrays based on hot-filament chemical vapor deposition</title><title>Thin solid films</title><description>Lateral porous anodic alumina (PAA) templates were used to organize carbon nanotubes (CNTs) grown by a hot-filament assisted chemical vapor deposition (HFCVD) process. For the CNT growth, we used a modified “home-made” HFCVD system with two independently powered filaments which are fitted respectively on the methane (CH
4) gas line, which serves as a carbon precursor and on the hydrogen (H
2) gas line, which acts as an etching agent for the parasitic amorphous carbon. Various activation powers of the hot filaments were used to directly or indirectly decompose the gas mixtures at relatively low substrate temperatures. A parametric study of the HFCVD process has been carried out for optimizing the confined CNTs growth inside the lateral PAA templates.</description><subject>Aluminum oxide</subject><subject>Anodic</subject><subject>Arrays</subject><subject>Carbon</subject><subject>Carbon nanotubes</subject><subject>Chemical vapor deposition</subject><subject>Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)</subject><subject>Condensed Matter</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Filaments</subject><subject>Hot-filament chemical vapor deposition</subject><subject>Materials Science</subject><subject>Methane</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Methods of nanofabrication</subject><subject>Nanoscale materials and structures: fabrication and characterization</subject><subject>Nanotubes</subject><subject>Other topics in nanoscale materials and structures</subject><subject>Physics</subject><subject>Porous anodic alumina</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2011</creationdate><recordtype>article</recordtype><recordid>eNp9kEGLEzEYhoMoWFd_gLe5CHqY8fuSdDKDp2VRVyjsZb14Cd8kGZsyTWqSFuqvN6XLHoVAIO_zvUkext4jdAjYf951Jc8dB8QOsBNCvmArHNTYciXwJVsBSGh7GOE1e5PzDgCQc7FivzZUXKJlOTcx_abg_zrbGEpTDE2gEMtxcg2lROfcTJRrWINtLO3sF9q7UBqzdXtvaGlOdIipse4Qsy8-hrfs1UxLdu-e9hv289vXx7v7dvPw_cfd7aY1UqjSivoyKRU3YkA5jFLZ2eDUcz6LfpysmqQd0U52kmt0ytlBkqzL1s_VaD2IG_bp2rulRR-S31M660he399u9OUMQI0SxHjCyn68socU_xxdLnrvs3HLQsHFY9bYK-RKClAVxStqUsw5ufm5G0FfnOudrs71xbkG1NV5nfnwVE-5KpkTBePz8yCXYhS4hsp9uXKuejl5l3Q23gXjrE_OFG2j_88t_wB6jpZI</recordid><startdate>20110502</startdate><enddate>20110502</enddate><creator>Kim, Ki-Hwan</creator><creator>Lefeuvre, Emmanuel</creator><creator>Châtelet, Marc</creator><creator>Pribat, Didier</creator><creator>Cojocaru, Costel Sorin</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope><scope>1XC</scope><scope>VOOES</scope><orcidid>https://orcid.org/0000-0002-9601-4647</orcidid><orcidid>https://orcid.org/0000-0002-5539-2051</orcidid></search><sort><creationdate>20110502</creationdate><title>Laterally organized carbon nanotube arrays based on hot-filament chemical vapor deposition</title><author>Kim, Ki-Hwan ; 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4) gas line, which serves as a carbon precursor and on the hydrogen (H
2) gas line, which acts as an etching agent for the parasitic amorphous carbon. Various activation powers of the hot filaments were used to directly or indirectly decompose the gas mixtures at relatively low substrate temperatures. A parametric study of the HFCVD process has been carried out for optimizing the confined CNTs growth inside the lateral PAA templates.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2011.01.334</doi><tpages>5</tpages><orcidid>https://orcid.org/0000-0002-9601-4647</orcidid><orcidid>https://orcid.org/0000-0002-5539-2051</orcidid><oa>free_for_read</oa></addata></record> |
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| subjects | Aluminum oxide Anodic Arrays Carbon Carbon nanotubes Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Condensed Matter Cross-disciplinary physics: materials science rheology Exact sciences and technology Filaments Hot-filament chemical vapor deposition Materials Science Methane Methods of deposition of films and coatings film growth and epitaxy Methods of nanofabrication Nanoscale materials and structures: fabrication and characterization Nanotubes Other topics in nanoscale materials and structures Physics Porous anodic alumina |
| title | Laterally organized carbon nanotube arrays based on hot-filament chemical vapor deposition |
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