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Study of the impact of hot carrier injection to immunity of MOSFET to electromagnetic interferences

► We use a simple model Sakurai–Newton model to model a 90nm NMOSFET. ► This model can well present the effect of hot carrier injection. ► This model can well present DC offset of drain current induced by EMI coupling on transistor terminals. ► We study the effect of hot carrier injection stress on...

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Bibliographic Details
Published in:Microelectronics and reliability 2011-09, Vol.51 (9-11), p.1557-1560
Main Authors: Li, B., Berbel, N., Boyer, A., BenDhia, S., Fernández-García, R.
Format: Article
Language:English
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Summary:► We use a simple model Sakurai–Newton model to model a 90nm NMOSFET. ► This model can well present the effect of hot carrier injection. ► This model can well present DC offset of drain current induced by EMI coupling on transistor terminals. ► We study the effect of hot carrier injection stress on the DC offsets induced by electromagnetic interferences. This paper presents an original study about the effect of hot carrier injection stress on the DC offsets induced by electromagnetic interferences (EMI) on a nanometric NMOS transistor, which is one of the major sources of failures in analog circuits. Measurements and simulations based on a simple model (Sakurai–Newton model) of fresh and stressed transistors are presented and show significant variations of EMI-induced DC shifts of drain current.
ISSN:0026-2714
1872-941X
DOI:10.1016/j.microrel.2011.06.010