Dimensional characterization of biperiodic imprinted structures using optical scatterometry

• Published in: Microelectronic engineering 2013-12, Vol.112, p.27-30
• Main Authors: Gereige, Issam, Pietroy, David, Eid, Jessica, Gourgon, Cécile
• Format: Article
• Language: English
• Subjects: 2D patterns; Applied sciences; Arrays; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Diffraction; Diffraction gratings; Electronics; Ellipsometry; Exact sciences and technology; Gratings (spectra); Lithography; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties; Materials science; Methods of nanofabrication; Microelectronic fabrication (materials and surfaces technology); Nanocomposites; Nanoimprint lithography; Nanomaterials; Nanoscale pattern formation; Nanostructure; Optical scatterometry; Other materials; Physics; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Specific materials; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thermoplastic resins
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/j.mee.2013.05.022

[Display omitted] •Characterization of 2D imprinted structures using optical scatterometry.•Non-destructive technique for residual thickness control.•Large area imprint process evaluation. In this paper, we report on the characterization of biperiodic imprinted structures using a non-destructive optical technique commonly called scatterometry. The nanostructures consist of periodic arrays of square and circular dots which were imprinted in a thermoplastic polymer by thermal nanoimprint lithography. Optical measurements were performed using spectroscopic ellipsometry in the spectral region of 1.5–4eV. The geometrical profiles of the imprinted structures were reconstructed using the Rigorous Coupled-Wave Analysis (RCWA) to model the diffraction phenomena by periodic gratings. The technique was also adapted for large scale evaluation of the imprint process. Uniqueness of the solution was examined by analyzing the diffraction of the structure at different experimental conditions, for instance at various angles of incidence.