Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

A chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom‐transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and li...

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Published in:Advanced materials (Weinheim) 2009-03, Vol.21 (10‐11), p.1121-1125
Main Authors: Chochos, Christos L., Ismailova, Esma, Brochon, Cyril, Leclerc, Nicolas, Tiron, Raluca, Sourd, Claire, Bandelier, Philippe, Foucher, Johann, Ridaoui, Hassan, Dirani, Ali, Soppera, Olivier, Perret, Damien, Brault, Christophe, Serra, Christophe A., Hadziioannou, Georges
Format: Article
Language:English
Subjects:
atom‐transfer radical polymerization
Chemical Sciences
line edge roughness
lithography
photoresist
polymeric materials
Polymers
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cited_by cdi_FETCH-LOGICAL-c3545-59335b125116c9b90e0c25e100ef11479667e9f54bb1835a13662c400bb3af013
cites cdi_FETCH-LOGICAL-c3545-59335b125116c9b90e0c25e100ef11479667e9f54bb1835a13662c400bb3af013
container_end_page 1125
container_issue 10‐11
container_start_page 1121
container_title Advanced materials (Weinheim)
container_volume 21
creator Chochos, Christos L.
Ismailova, Esma
Brochon, Cyril
Leclerc, Nicolas
Tiron, Raluca
Sourd, Claire
Bandelier, Philippe
Foucher, Johann
Ridaoui, Hassan
Dirani, Ali
Soppera, Olivier
Perret, Damien
Brault, Christophe
Serra, Christophe A.
Hadziioannou, Georges
description A chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom‐transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and line‐edge roughness (3σ) values comparable to those of the reference (commercial) resist.
doi_str_mv 10.1002/adma.200801715
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source Wiley-Blackwell Read & Publish Collection
subjects atom‐transfer radical polymerization
Chemical Sciences
line edge roughness
lithography
photoresist
polymeric materials
Polymers
title Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances
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