Thermal conductivity of silicon nitride membranes is not sensitive to stress

We have measured the thermal properties of suspended membranes from 10 K to 300 K for two amplitudes of internal stress (about 0.1 GPa and 1 GPa) and for two different thicknesses (50 nm and 100 nm). The use of the original 3ω-Volklein method has allowed the extraction of both the specific heat and...

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Bibliographic Details
Published in:Physical review. B, Condensed matter and materials physics Condensed matter and materials physics, 2015-09, Vol.92 (12), Article 125439
Main Authors: Ftouni, Hossein, Blanc, Christophe, Tainoff, Dimitri, Fefferman, Andrew D., Defoort, Martial, Lulla, Kunal J., Richard, Jacques, Collin, Eddy, Bourgeois, Olivier
Format: Article
Language:English
Subjects:
Physics
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Summary:We have measured the thermal properties of suspended membranes from 10 K to 300 K for two amplitudes of internal stress (about 0.1 GPa and 1 GPa) and for two different thicknesses (50 nm and 100 nm). The use of the original 3ω-Volklein method has allowed the extraction of both the specific heat and the thermal conductivity of each SiN membrane over a wide temperature range. The mechanical properties of the same substrates have been measured at helium temperatures using nanomechanical techniques. Our measurements show that the thermal transport in freestanding SiN membranes is not affected by the presence of internal stress. Consistently, mechanical dissipa
ISSN:1098-0121
1550-235X
DOI:10.1103/PhysRevB.92.125439