Bit patterned media based on block copolymer directed assembly with narrow magnetic switching field distribution

Electron-beam (E-beam) directed assembly, which combines the long-range phase and placement registration of e-beam lithography with the sharp dot size and spacing uniformity of block copolymer self assembly, is considered highly promising for fabricating templates that meet the tight magnetic specif...

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Bibliographic Details
Published in:Applied physics letters 2010-02, Vol.96 (5)
Main Authors: Hellwig, O., Bosworth, J. K., Dobisz, E., Kercher, D., Hauet, T., Zeltzer, G., Risner-Jamtgaard, J. D., Yaney, D., Ruiz, R.
Format: Article
Language:English
Subjects:
Condensed Matter
Materials Science
Physics
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Summary:Electron-beam (E-beam) directed assembly, which combines the long-range phase and placement registration of e-beam lithography with the sharp dot size and spacing uniformity of block copolymer self assembly, is considered highly promising for fabricating templates that meet the tight magnetic specifications required for write synchronization in bit patterned media magnetic recording systems. In our study, we show that this approach also yields a narrower magnetic switching field distribution (SFD) than e-beam patterning or block copolymer self-assembly alone. We demonstrate that the pattern uniformity, i.e., island diameter and placement distributions are also important for achieving tight magnetic SFDs.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3293301