Ion beam sputtered aluminum based multilayer mirrors for extreme ultraviolet solar imaging

In this paper, we report on the design, synthesis and characterization of extreme ultraviolet interferential mirrors for solar imaging applications in the spectral range 17nm–34nm. This research is carried out in the context of the preparation of the European Space Agency Solar Orbiter mission. The...

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Bibliographic Details
Published in:Thin solid films 2014-02, Vol.552, p.62-67
Main Authors: Ziani, A., Delmotte, F., Le Paven-Thivet, C., Meltchakov, E., Jérome, A., Roulliay, M., Bridou, F., Gasc, K.
Format: Article
Language:English
Subjects:
Aluminum
Astrophysics
Condensed Matter
Cross-disciplinary physics: materials science
rheology
Deposition
Deposition by sputtering
EUV
Exact sciences and technology
Imaging
Instrumentation and Methods for Astrophysic
Ion and electron beam-assisted deposition
ion plating
Ion beam sputtering
Ion beams
Materials Science
Methods of deposition of films and coatings
film growth and epitaxy
Molybdenum
Multilayers
Optics
Physics
Silicon carbide
Solar and Stellar Astrophysics
Solar Orbiter
Ultraviolet
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Summary:In this paper, we report on the design, synthesis and characterization of extreme ultraviolet interferential mirrors for solar imaging applications in the spectral range 17nm–34nm. This research is carried out in the context of the preparation of the European Space Agency Solar Orbiter mission. The purpose of this study consists in optimizing the deposition of Al-based multilayers by ion beam sputtering according to several parameters such as the ion beam current and the sputtering angle. After optimization of Al thin films, several kinds of Al-based multilayer mirrors have been compared. We have deposited and characterized bi-material and also tri-material periodic multilayers: aluminum/molybdenum [Al/Mo], aluminum/molybdenum/boron carbide [Al/Mo/B4C] and aluminum/molybdenum/silicon carbide [Al/Mo/SiC]. Best experimental results have been obtained on Al/Mo/SiC samples: we have measured reflectivity up to 48% at 17.3nm and 27.5% at 28.2nm on a synchrotron radiation source. •Design and synthesis of extreme ultraviolet interferential mirrors.•Optimization of aluminum thin films by adjusting several deposition parameters.•Comparison of results obtained with different types of Al-based multilayer mirrors.•Reflectivity up to 48% at 17.3nm on a synchrotron radiation source.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2013.12.015