Growth of polycrystalline Pr2NiO4+δ coating on alumina substrate by RF magnetron co-sputtering from composite targets

Polycrystalline Pr2NiO4+δ coatings have been deposited on alumina substrates at room temperature by RF magnetron co-sputtering from Pr and Ni metallic composite target. The mixed target's area and the sputtering conditions were optimized to reach an atomic ratio Pr/Ni of 2. A subsequent anneali...

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Bibliographic Details
Published in:Thin solid films 2016-02, Vol.600, p.131-135
Main Authors: Sediri, A., Zaghrioui, M., Barichard, A., Autret, C., Negulescu, B., Del Campo, L., Echegut, P., Laffez, P.
Format: Article
Language:English
Subjects:
Aluminum oxide
Coating
Condensed Matter
Deposition
Diffraction
Infrared emittance
Nickel
Physics
Pr2NiO4+δ coatings
RF magnetron co-sputtering
Spectral emissivity
Spectral emittance
Thin films
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Summary:Polycrystalline Pr2NiO4+δ coatings have been deposited on alumina substrates at room temperature by RF magnetron co-sputtering from Pr and Ni metallic composite target. The mixed target's area and the sputtering conditions were optimized to reach an atomic ratio Pr/Ni of 2. A subsequent annealing, at 1050–1100°C, allowed obtaining Pr2NiO4+δ phase after in situ high temperature x-ray diffraction study performed on as-deposited film. Microstructural analyses (SEM and AFM) revealed dense and rough microstructure. Normal spectral emittance measurements performed at 794 °C in the spectral range 400–5000cm-1 showed an emissivity of ε≈0.8. •Pr2NiO4+δ coatings deposited by RF magnetron co-sputtering•Crystallization kinetic studied by X-ray diffraction versus temperature•SEM and AFM observations showed dense and rough microstructure•Normal spectral emittance reaches to ε=0.8 at 794°C in the opaque zone.
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2016.01.023