Structure and morphological study of nanometer W and W3O thin films

In this paper, the structure of nanometer tungsten thin films has been correlated to their surface morphology. Films have been deposited by RF-sputtering at a working pressure of 0.5 Pa and with a power density of 1.18 W/cm2. Two phases with different morphology have been observed: W3O with a nanogr...

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 2003-03, Vol.428 (1-2), p.237-241
Main Authors: MAILLE, L, SANT, C, LE PAVEN-THIVET, C, LEGRAND-BUSCEMA, C, GARNIER, P
Format: Article
Language:English
Subjects:
Applied sciences
Chemical Sciences
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Exact sciences and technology
Material chemistry
Materials science
Metals. Metallurgy
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Structure and morphology
thickness
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:In this paper, the structure of nanometer tungsten thin films has been correlated to their surface morphology. Films have been deposited by RF-sputtering at a working pressure of 0.5 Pa and with a power density of 1.18 W/cm2. Two phases with different morphology have been observed: W3O with a nanograins structure is present in the first step of the tungsten growth; and, when the thickness is increased, a pure tungsten Wolfram phase (W) with a lamellar structure appears. We demonstrate that W3O is related to a pollution of the target surface between two growth runs. We succeed to suppress this phase and to obtain pure tungsten Wolfram nanolayer, in order to realize (W/WO3)n multilayer.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(02)01277-4