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On the determination of growth stress during oxidation of pure zirconium at elevated temperature

•Experimental set-up of DTMO test is described.•Stresses developed during heating at 400 °C and 500 °C are different.•Acoustic emission activity have been correlated with stress relaxation phenomena.•Oxide scale behavior during cooling process have been described. An experimental approach have been...

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Bibliographic Details
Published in:Applied surface science 2018-07, Vol.446, p.27-35
Main Authors: Kurpaska, L., Favergeon, J., Lahoche, L., Moulin, G.
Format: Article
Language:English
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Summary:•Experimental set-up of DTMO test is described.•Stresses developed during heating at 400 °C and 500 °C are different.•Acoustic emission activity have been correlated with stress relaxation phenomena.•Oxide scale behavior during cooling process have been described. An experimental approach have been proposed to evaluate growth of stress during high temperature oxidation of pure zirconium. The development of stress in the oxide scale has been investigated experimentally in in-situ conditions by combining the Deflection Test in Monofacial Oxidation (DTMO) with Acoustic Emission analysis (AE). Microstructure of the sample were studied by using Scanning Electron Microscopy technique. Oxidation experiments were performed continuously during 24 h at 400 °C and 500 °C in air under normal atmospheric pressure. Taking into account purely elastic behaviour of the material, primary evolution of growth stress developed in the oxide scale during oxidation process have been estimated. Presented study of the Zr/ZrO2 system revealed two opposite phenomena of stress relief when cooling from 400 °C and 500 °C to room temperature. This study is presented as a tool to understand the phenomena of stress evolution in the zirconia layer during isothermal treatment at high temperature and after cooling.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2018.02.215