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Resistive switching study in HfO 2 based resistive memories by conductive atomic force microscopy in vacuum
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Published in: | Journal of applied physics 2018-07, Vol.124 (1) |
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Language: | English |
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container_title | Journal of applied physics |
container_volume | 124 |
creator | Singh, A. Blonkowski, S. Kogelschatz, M. |
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doi_str_mv | 10.1063/1.5025143 |
format | article |
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identifier | ISSN: 0021-8979 |
ispartof | Journal of applied physics, 2018-07, Vol.124 (1) |
issn | 0021-8979 1089-7550 |
language | eng |
recordid | cdi_hal_primary_oai_HAL_hal_01942874v1 |
source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list) |
subjects | Physics |
title | Resistive switching study in HfO 2 based resistive memories by conductive atomic force microscopy in vacuum |
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