Gate Oxide Electrical Stability of p-type Diamond MOS Capacitors

This paper shows the effect of performing consecutive measurement prior to negative bias stress instability (NBSI) on diamond metal-oxide-semiconductor capacitor (MOSCAP). For the first time, time-dependent stress tests have been carried out in order to investigate the stability of the flatband volt...

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Bibliographic Details
Published in:IEEE transactions on electron devices 2018-08, Vol.65 (8), p.3361-3364
Main Authors: Loto, O., Florentin, M., Masante, C., Donato, N., Hicks, M.-L., Pakpour-Tabrizi, A. C., Jackman, R. B., Zuerbig, V., Godignon, P., Eon, D., Pernot, J., Udrea, F., Gheeraert, E.
Format: Article
Language:English
Subjects:
Annealing
Bias
Capacitors
Condensed Matter
Diamond
Diamonds
Electric potential
Electronics
Engineering Sciences
flatband voltage
Logic gates
Materials Science
metal–oxide–semiconductor interface
oxide reliability
Performance evaluation
Physics
Reliability
Stability
Stresses
Time dependence
Time measurement
Voltage measurement
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Summary:This paper shows the effect of performing consecutive measurement prior to negative bias stress instability (NBSI) on diamond metal-oxide-semiconductor capacitor (MOSCAP). For the first time, time-dependent stress tests have been carried out in order to investigate the stability of the flatband voltage ( {V}_{\text {FB}} ) of MOSCAPs through capacitance-voltage ( CV ) measurements. Two tests have been performed. In the first test, consecutive CV measurements with the device biased from deep depletion to the accumulation regime were performed to monitor the recovery of the {V}_{\text {FB}} . In the second test, NBSI technique has been applied. {V}_{\text {FB}} stability has been measured by means of a time-dependent bias stress in which the device was polarized at a fixed negative voltage for a specific time interval prior to performing the next CV measurement. As {V}_{\text {FB}} is directly connected to the effective oxide charge ( {N}_{\text {eff}} ), the two different tests allowed the extraction of total amount of {N}_{\text {eff}} that interfered during the measurements. The result observed shows that the postoxidation annealing process induces a strong enhancement of the MOSCAP stability together with a decrease of {N}_{\text {eff}}
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2018.2847340