Loading…

Kinetics of light-induced degradation in compensated boron-doped silicon investigated using photoluminescence and numerical simulation

We use photoluminescence to observe light-induced degradation in silicon in real time. Numerical simulations are used to match our results and lifetime decay data from the literature with theoretical models for the generation of the light-induced boron–oxygen defects. It is found that the existing m...

Full description

Saved in:
Bibliographic Details
Published in:Materials science in semiconductor processing 2015-05, Vol.33, p.49-57
Main Authors: Fraser, K., Blanc-Pelissier, D., Dubois, S., Veirman, J., Lemiti, M.
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by
cites cdi_FETCH-LOGICAL-c285t-a383611077b1ea3dbe5a82b03fa855b100db2e16c178d315410f203ba0502bca3
container_end_page 57
container_issue
container_start_page 49
container_title Materials science in semiconductor processing
container_volume 33
creator Fraser, K.
Blanc-Pelissier, D.
Dubois, S.
Veirman, J.
Lemiti, M.
description We use photoluminescence to observe light-induced degradation in silicon in real time. Numerical simulations are used to match our results and lifetime decay data from the literature with theoretical models for the generation of the light-induced boron–oxygen defects. It is found that the existing model of the slowly generated defect SRC, where its saturated concentration is a function of the majority carrier concentration, does not explain certain results in both p- and n-type samples. A new model is proposed in which the saturated SRC concentration is controlled by the total hole concentration under illumination.
doi_str_mv 10.1016/j.mssp.2015.01.016
format article
fullrecord <record><control><sourceid>hal_cross</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_02059535v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S1369800115000268</els_id><sourcerecordid>oai_HAL_hal_02059535v1</sourcerecordid><originalsourceid>FETCH-LOGICAL-c285t-a383611077b1ea3dbe5a82b03fa855b100db2e16c178d315410f203ba0502bca3</originalsourceid><addsrcrecordid>eNp9kE1rwzAMhsPYYJ9_YKdcd0gn2XWawi5j7IsVdtnOxrGdViWxg50U9gf2u-e0Y8eBQEJ6Hwm9WXaNMEPA8nY762LsZwxQzABTlEfZGVYLXsyhwuNU83JZVAB4mp3HuAUAwbA8y77fyNmBdMx9k7e03gwFOTNqa3Jj10EZNZB3Oblc-663LqohjWofvCuM71MdqSW9l-xsHGi9F4yR3DrvN37w7dilE1Fbp22unMnd2NlAWrUJ7cZ2f-AyO2lUG-3Vb77IPp8ePx5eitX78-vD_arQrBJDoXjFS0RYLGq0ipvaClWxGnijKiFqBDA1s1hqXFSGo5gjNAx4rUAAq7XiF9nNYe9GtbIP1KnwJb0i-XK_klMPGIil4GKHScsOWh18jME2fwCCnFyXWzm5LifXJWCKMkF3B8imL3Zkg4yaptcNBasHaTz9h_8AbpWOmQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Kinetics of light-induced degradation in compensated boron-doped silicon investigated using photoluminescence and numerical simulation</title><source>ScienceDirect Freedom Collection</source><creator>Fraser, K. ; Blanc-Pelissier, D. ; Dubois, S. ; Veirman, J. ; Lemiti, M.</creator><creatorcontrib>Fraser, K. ; Blanc-Pelissier, D. ; Dubois, S. ; Veirman, J. ; Lemiti, M.</creatorcontrib><description>We use photoluminescence to observe light-induced degradation in silicon in real time. Numerical simulations are used to match our results and lifetime decay data from the literature with theoretical models for the generation of the light-induced boron–oxygen defects. It is found that the existing model of the slowly generated defect SRC, where its saturated concentration is a function of the majority carrier concentration, does not explain certain results in both p- and n-type samples. A new model is proposed in which the saturated SRC concentration is controlled by the total hole concentration under illumination.</description><identifier>ISSN: 1369-8001</identifier><identifier>EISSN: 1873-4081</identifier><identifier>DOI: 10.1016/j.mssp.2015.01.016</identifier><language>eng</language><publisher>Elsevier Ltd</publisher><subject>Engineering Sciences ; Light-induced degradation ; Micro and nanotechnologies ; Microelectronics ; Modeling ; Photoluminescence ; Photovoltaics ; Silicon</subject><ispartof>Materials science in semiconductor processing, 2015-05, Vol.33, p.49-57</ispartof><rights>2015</rights><rights>Distributed under a Creative Commons Attribution 4.0 International License</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c285t-a383611077b1ea3dbe5a82b03fa855b100db2e16c178d315410f203ba0502bca3</cites><orcidid>0000-0002-4144-3786</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27923,27924</link.rule.ids><backlink>$$Uhttps://hal.science/hal-02059535$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Fraser, K.</creatorcontrib><creatorcontrib>Blanc-Pelissier, D.</creatorcontrib><creatorcontrib>Dubois, S.</creatorcontrib><creatorcontrib>Veirman, J.</creatorcontrib><creatorcontrib>Lemiti, M.</creatorcontrib><title>Kinetics of light-induced degradation in compensated boron-doped silicon investigated using photoluminescence and numerical simulation</title><title>Materials science in semiconductor processing</title><description>We use photoluminescence to observe light-induced degradation in silicon in real time. Numerical simulations are used to match our results and lifetime decay data from the literature with theoretical models for the generation of the light-induced boron–oxygen defects. It is found that the existing model of the slowly generated defect SRC, where its saturated concentration is a function of the majority carrier concentration, does not explain certain results in both p- and n-type samples. A new model is proposed in which the saturated SRC concentration is controlled by the total hole concentration under illumination.</description><subject>Engineering Sciences</subject><subject>Light-induced degradation</subject><subject>Micro and nanotechnologies</subject><subject>Microelectronics</subject><subject>Modeling</subject><subject>Photoluminescence</subject><subject>Photovoltaics</subject><subject>Silicon</subject><issn>1369-8001</issn><issn>1873-4081</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNp9kE1rwzAMhsPYYJ9_YKdcd0gn2XWawi5j7IsVdtnOxrGdViWxg50U9gf2u-e0Y8eBQEJ6Hwm9WXaNMEPA8nY762LsZwxQzABTlEfZGVYLXsyhwuNU83JZVAB4mp3HuAUAwbA8y77fyNmBdMx9k7e03gwFOTNqa3Jj10EZNZB3Oblc-663LqohjWofvCuM71MdqSW9l-xsHGi9F4yR3DrvN37w7dilE1Fbp22unMnd2NlAWrUJ7cZ2f-AyO2lUG-3Vb77IPp8ePx5eitX78-vD_arQrBJDoXjFS0RYLGq0ipvaClWxGnijKiFqBDA1s1hqXFSGo5gjNAx4rUAAq7XiF9nNYe9GtbIP1KnwJb0i-XK_klMPGIil4GKHScsOWh18jME2fwCCnFyXWzm5LifXJWCKMkF3B8imL3Zkg4yaptcNBasHaTz9h_8AbpWOmQ</recordid><startdate>20150501</startdate><enddate>20150501</enddate><creator>Fraser, K.</creator><creator>Blanc-Pelissier, D.</creator><creator>Dubois, S.</creator><creator>Veirman, J.</creator><creator>Lemiti, M.</creator><general>Elsevier Ltd</general><general>Elsevier</general><scope>AAYXX</scope><scope>CITATION</scope><scope>1XC</scope><orcidid>https://orcid.org/0000-0002-4144-3786</orcidid></search><sort><creationdate>20150501</creationdate><title>Kinetics of light-induced degradation in compensated boron-doped silicon investigated using photoluminescence and numerical simulation</title><author>Fraser, K. ; Blanc-Pelissier, D. ; Dubois, S. ; Veirman, J. ; Lemiti, M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c285t-a383611077b1ea3dbe5a82b03fa855b100db2e16c178d315410f203ba0502bca3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Engineering Sciences</topic><topic>Light-induced degradation</topic><topic>Micro and nanotechnologies</topic><topic>Microelectronics</topic><topic>Modeling</topic><topic>Photoluminescence</topic><topic>Photovoltaics</topic><topic>Silicon</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fraser, K.</creatorcontrib><creatorcontrib>Blanc-Pelissier, D.</creatorcontrib><creatorcontrib>Dubois, S.</creatorcontrib><creatorcontrib>Veirman, J.</creatorcontrib><creatorcontrib>Lemiti, M.</creatorcontrib><collection>CrossRef</collection><collection>Hyper Article en Ligne (HAL)</collection><jtitle>Materials science in semiconductor processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fraser, K.</au><au>Blanc-Pelissier, D.</au><au>Dubois, S.</au><au>Veirman, J.</au><au>Lemiti, M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Kinetics of light-induced degradation in compensated boron-doped silicon investigated using photoluminescence and numerical simulation</atitle><jtitle>Materials science in semiconductor processing</jtitle><date>2015-05-01</date><risdate>2015</risdate><volume>33</volume><spage>49</spage><epage>57</epage><pages>49-57</pages><issn>1369-8001</issn><eissn>1873-4081</eissn><abstract>We use photoluminescence to observe light-induced degradation in silicon in real time. Numerical simulations are used to match our results and lifetime decay data from the literature with theoretical models for the generation of the light-induced boron–oxygen defects. It is found that the existing model of the slowly generated defect SRC, where its saturated concentration is a function of the majority carrier concentration, does not explain certain results in both p- and n-type samples. A new model is proposed in which the saturated SRC concentration is controlled by the total hole concentration under illumination.</abstract><pub>Elsevier Ltd</pub><doi>10.1016/j.mssp.2015.01.016</doi><tpages>9</tpages><orcidid>https://orcid.org/0000-0002-4144-3786</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 1369-8001
ispartof Materials science in semiconductor processing, 2015-05, Vol.33, p.49-57
issn 1369-8001
1873-4081
language eng
recordid cdi_hal_primary_oai_HAL_hal_02059535v1
source ScienceDirect Freedom Collection
subjects Engineering Sciences
Light-induced degradation
Micro and nanotechnologies
Microelectronics
Modeling
Photoluminescence
Photovoltaics
Silicon
title Kinetics of light-induced degradation in compensated boron-doped silicon investigated using photoluminescence and numerical simulation
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-12T02%3A44%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-hal_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Kinetics%20of%20light-induced%20degradation%20in%20compensated%20boron-doped%20silicon%20investigated%20using%20photoluminescence%20and%20numerical%20simulation&rft.jtitle=Materials%20science%20in%20semiconductor%20processing&rft.au=Fraser,%20K.&rft.date=2015-05-01&rft.volume=33&rft.spage=49&rft.epage=57&rft.pages=49-57&rft.issn=1369-8001&rft.eissn=1873-4081&rft_id=info:doi/10.1016/j.mssp.2015.01.016&rft_dat=%3Chal_cross%3Eoai_HAL_hal_02059535v1%3C/hal_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c285t-a383611077b1ea3dbe5a82b03fa855b100db2e16c178d315410f203ba0502bca3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true