Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry

We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detecti...

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Bibliographic Details
Published in:Journal of low temperature physics 2019-12, Vol.197 (5-6), p.348-356
Main Authors: Nguyen, Tuyen, Tavakoli, Adib, Triqueneaux, Sebastien, Swami, Rahul, Ruhtinas, Aki, Gradel, Jeremy, Garcia-Campos, Pablo, Hasselbach, Klaus, Frydman, Aviad, Piot, Benjamin, Gibert, Mathieu, Collin, Eddy, Bourgeois, Olivier
Format: Article
Language:English
Subjects:
Characterization and Evaluation of Materials
Coefficient of variation
Condensed Matter
Condensed Matter Physics
Electrical impedance
Low temperature physics
Magnetic Materials
Magnetism
Mesoscopic Systems and Quantum Hall Effect
Niobium nitride
Physics
Physics and Astronomy
Temperature
Thermometry
Thin films
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Summary:We investigate thin-film resistive thermometry based on metal-to-insulator transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance has been calibrated versus temperature and magnetic field. High sensitivity in temperature variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin-film technology through applications in very different low-temperature use cases. We demonstrate that thin-film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.
ISSN:0022-2291
1573-7357
DOI:10.1007/s10909-019-02222-6