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Improved adhesion of poly(3,4-ethylenedioxythiophene) (PEDOT) thin film to solid substrates using electrografted promoters and application to efficient nanoplasmonic devices

•A two step-strategy is used to enhance PEDOT adhesion on ITO and Gold.•It uses the electrochemical grafting of ultrathin layers incorporating thiophene or ethylene dioxythiophene moities.•These ultrathin layers (less than 10 nm), act as organic electrodes and considerably promote PEDOT adhesion on...

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Bibliographic Details
Published in:Synthetic metals 2019-02, Vol.248, p.45-52
Main Authors: Villemin, Elise, Lemarque, Baptiste, Vũ, Thi Thiêt, Nguyen, Van Quynh, Trippé-Allard, Gaelle, Martin, Pascal, Lacaze, Pierre-Camille, Lacroix, Jean-Christophe
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Language:English
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Summary:•A two step-strategy is used to enhance PEDOT adhesion on ITO and Gold.•It uses the electrochemical grafting of ultrathin layers incorporating thiophene or ethylene dioxythiophene moities.•These ultrathin layers (less than 10 nm), act as organic electrodes and considerably promote PEDOT adhesion on ITO and Gold.•Active plasmonic devices with enhanced stability are then reported. In this work we present a new strategy to enhance poly(ethylenedioxythiophene) (PEDOT) adhesion to solid substrates (Indium Tin Oxide-ITO and gold). Two derivatives, incorporating thiophene or ethylenedioxythiophene moieties, are first electrografted from diazonium salt precursors. The resulting ultrathin layers act as adhesion promoters for ITO and gold electrodes. In a second step, EDOT is electropolymerized on the modified surface. Adhesion tests, using ultrasonication, of the PEDOT layer deposited on bare or on modified ITO electrodes show that the presence of the ultrathin layer leads to an improvement of the PEDOT adhesion while retaining its electronic properties. This strategy was used to prepare stable plasmonic devices with gold nanoparticles surrounded by PEDOT film. We show that their plasmonic properties are not changed by the adhesion layer and that their lifetime are greatly improved.
ISSN:0379-6779
1879-3290
DOI:10.1016/j.synthmet.2018.12.010