In-situ interferometric monitoring of optical coatings

We present a new method for the in situ measurement of the amplitude and phase of the reflection coefficient of a plane substrate installed in a mechanical holder rotating at high speed (120 turns per minute) during the deposition of optical thin films. Our method is based on digital holography and...

Full description

Saved in:
Bibliographic Details
Published in:Optics express 2020-07, Vol.28 (15), p.22012-22026
Main Authors: Nadji, Séverin L., Lequime, Michel, Begou, Thomas, Koc, Cihan, Grèzes-Besset, Catherine, Lumeau, Julien
Format: Article
Language:English
Subjects:
Engineering Sciences
Optics
Photonic
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We present a new method for the in situ measurement of the amplitude and phase of the reflection coefficient of a plane substrate installed in a mechanical holder rotating at high speed (120 turns per minute) during the deposition of optical thin films. Our method is based on digital holography and uses a self-referenced scheme to cancel the effects of the severe constraints generated by the vibrational and thermal environment of the deposition machine.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.394953