Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions

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Bibliographic Details
Published in:Thin solid films 2020-03, Vol.698, p.137874
Main Authors: Cartailler, Vivien, Imbert, Grégory, Rochat, Névine, Chaton, Catherine, Vo-Thanh, Du, Benoit, Daniel, Duchamp, Geneviève, Frémont, Hélène
Format: Article
Language:English
Subjects:
Physics
Online Access:Get full text
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ISSN:0040-6090
DOI:10.1016/j.tsf.2020.137874