Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions

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Published in:Thin solid films 2020-03, Vol.698, p.137874
Main Authors: Cartailler, Vivien, Imbert, Grégory, Rochat, Névine, Chaton, Catherine, Vo-Thanh, Du, Benoit, Daniel, Duchamp, Geneviève, Frémont, Hélène
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container_title Thin solid films
container_volume 698
creator Cartailler, Vivien
Imbert, Grégory
Rochat, Névine
Chaton, Catherine
Vo-Thanh, Du
Benoit, Daniel
Duchamp, Geneviève
Frémont, Hélène
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doi_str_mv 10.1016/j.tsf.2020.137874
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title Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions
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