MOCVD of hard metallurgical coatings: Examples in the Cr–C–N system

All individual phases of the ternary Cr–C–N system including stable and metastable ones can be deposited at low temperature by metalorganic chemical vapor deposition (MOCVD). These growth processes are mainly based on the use of bis(benzene)chromium as chromium source and various co-reactives. Then,...

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Bibliographic Details
Published in:Electrochimica acta 2005-08, Vol.50 (23), p.4525-4530
Main Author: Maury, F.
Format: Article
Language:English
Subjects:
Chemical Sciences
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Chromium carbides
Chromium nitrides
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Hard coatings
Material chemistry
Materials science
Metalorganic precursors
Methods of deposition of films and coatings
film growth and epitaxy
MOCVD
Physics
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Summary:All individual phases of the ternary Cr–C–N system including stable and metastable ones can be deposited at low temperature by metalorganic chemical vapor deposition (MOCVD). These growth processes are mainly based on the use of bis(benzene)chromium as chromium source and various co-reactives. Then, from a good control of the reactive gas phase, it is possible to combine these MOCVD processes to grow in the same reactor protective coatings designed with a complex architecture based on polyphased, nanostructured or multilayer structure which exhibit enhanced properties. These deposition processes are described and the main features of the coatings are discussed.
ISSN:0013-4686
1873-3859
DOI:10.1016/j.electacta.2004.10.088