Anisotropy in metallic thin films patterned by the atomic saw method

The use of atomic saw method applied to thin metallic epitaxial systems with in-plane magnetization has allowed us to exhibit strong magnetic anisotropy. The structuration of thin 40 Å Co thin films into 0.5 μm large stripes have induced a uniaxial anisotropy field whose direction and magnitude 500...

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Bibliographic Details
Published in:Journal of magnetism and magnetic materials 1999-08, Vol.203 (1), p.132-134
Main Authors: Jaffrès, H, Ressier, L, Michelini, F, Chandesris, D, Le Fèvre, P, Magnan, H, Gauffier, J.L, Mamy, R, Goiran, M, Peyrade, J.P, Bobo, J.F, Ousset, J.C, Redoulès, J.P, Bertrand, D, Fert, A.R
Format: Article
Language:English
Subjects:
Anisotropy
Applied sciences
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Exact sciences and technology
EXAFS
Magnetic properties and materials
Magnetic properties of monolayers and thin films
Magnetic properties of surface, thin films and multilayers
Metals. Metallurgy
Nanostructures
Physics
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Summary:The use of atomic saw method applied to thin metallic epitaxial systems with in-plane magnetization has allowed us to exhibit strong magnetic anisotropy. The structuration of thin 40 Å Co thin films into 0.5 μm large stripes have induced a uniaxial anisotropy field whose direction and magnitude 500 Oe is consistent with shape energy consideration. On the other hand, the same structuration applied to 20 Å Fe thin films have induced a uniaxial magnetic anisotropy explained by the observation of a uniaxial relaxation of the strain field after process. EXAFS experiments has permitted to quantify this lattice relaxation which is seen to distort the initial BCC Fe cell uniaxially inducing strong magnetoelastic effects.
ISSN:0304-8853
1873-4766
DOI:10.1016/S0304-8853(99)00212-7