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Photochemical Strain‐Release‐Driven Cyclobutylation of C(sp3)‐Centered Radicals
A new photoredox‐catalyzed decarboxylative radical addition approach to functionalized cyclobutanes is described. The reaction involves an unprecedented formal Giese‐type addition of C(sp3)‐centered radicals to highly strained bicyclo[1.1.0]butanes. The mild photoredox conditions, which make use of...
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Published in: | Angewandte Chemie International Edition 2020-02, Vol.59 (7), p.2618-2622 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | A new photoredox‐catalyzed decarboxylative radical addition approach to functionalized cyclobutanes is described. The reaction involves an unprecedented formal Giese‐type addition of C(sp3)‐centered radicals to highly strained bicyclo[1.1.0]butanes. The mild photoredox conditions, which make use of a readily available and bench stable phenyl sulfonyl bicyclo[1.1.0]butane, proved to be amenable to a diverse range of α‐amino and α‐oxy carboxylic acids, providing a concise route to 1,3‐disubstituted cyclobutanes. Furthermore, kinetic studies and DFT calculations unveiled mechanistic details on bicyclo[1.1.0]butane reactivity relative to the corresponding olefin system.
High‐lying SOMO radicals, generated in situ under visible‐light photoredox conditions, undergo an efficient addition to highly strained bicyclo[1.1.0]butanes, providing a straightforward access to valuable alkylated cyclobutanes. |
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ISSN: | 1433-7851 1521-3773 |
DOI: | 10.1002/anie.201908951 |