Loading…

Mobility Extraction Using Improved Resistance Partitioning Methodology for Normally-OFF Fully Vertical GaN Trench MOSFETs

In this work, fully vertical GaN trench MOSFETs were fabricated and characterized to evaluate their electrical performances. Transistors show a normally-OFF behavior with a high I[sub.ON]/I[sub.OFF] (~10[sup.9]) ratio and a significantly small gate leakage current (10[sup.−11] A/mm). Thanks to an im...

Full description

Saved in:
Bibliographic Details
Published in:Electronics (Basel) 2024-06, Vol.13 (12), p.2350
Main Authors: Ackermann, Valentin, Mohamad, Blend, El Rammouz, Hala, Maurya, Vishwajeet, Frayssinet, Eric, Cordier, Yvon, Charles, Matthew, Lefevre, Gauthier, Buckley, Julien, Salem, Bassem
Format: Article
Language:English
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by
cites
container_end_page
container_issue 12
container_start_page 2350
container_title Electronics (Basel)
container_volume 13
creator Ackermann, Valentin
Mohamad, Blend
El Rammouz, Hala
Maurya, Vishwajeet
Frayssinet, Eric
Cordier, Yvon
Charles, Matthew
Lefevre, Gauthier
Buckley, Julien
Salem, Bassem
description In this work, fully vertical GaN trench MOSFETs were fabricated and characterized to evaluate their electrical performances. Transistors show a normally-OFF behavior with a high I[sub.ON]/I[sub.OFF] (~10[sup.9]) ratio and a significantly small gate leakage current (10[sup.−11] A/mm). Thanks to an improved resistance partitioning method, the resistances of the trench bottom and trench channel were extracted accurately by taking into account different charging conditions. This methodology enabled an estimation of the effective channel and bottom mobility of 11.1 cm[sup.2]/V·s and 15.1 cm[sup.2]/V·s, respectively.
doi_str_mv 10.3390/electronics13122350
format article
fullrecord <record><control><sourceid>gale_hal_p</sourceid><recordid>TN_cdi_hal_primary_oai_HAL_hal_04673055v1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><galeid>A799432531</galeid><sourcerecordid>A799432531</sourcerecordid><originalsourceid>FETCH-LOGICAL-g231t-e20de4a701557b104e38113326c9bb397c52222c2148c75640c334b870ec32aa3</originalsourceid><addsrcrecordid>eNpNkE9LAzEQxRdRUKqfwEvAk4fVJLPbNMdSbBX6R9R6XbLptI2km5qkxf32ZqkHZw7zePwY3kyW3TL6ACDpI1rU0bvG6MCAcQ4lPcuuOBUyl1zy83_6MrsJ4YumkgwGQK-yduZqY01sydNP9EpH4xqyDKbZkJfd3rsjrsgbBhOiajSSV-Wj6ZgOmGHcupWzbtOStfNk7vxOWdvmi_GYjA9JkU9MvFaWTNScfHhs9JbMFu_jp49wnV2slQ148zd72TLZo-d8upi8jIbTfMOBxRw5XWGhBGVlKWpGC4QBYwC8r2VdgxS65Kk0Z8VAi7JfUA1Q1ANBUQNXCnrZ_WnvVtlq781O-bZyylTPw2nVebToC6BleWSJvTux6fLvA4ZYfbmDb1K8CqhIeRLYUQ8naqMsVqZZu-5zqVe4M9o1uDbJHwopC-AlMPgF601_WA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>3072317301</pqid></control><display><type>article</type><title>Mobility Extraction Using Improved Resistance Partitioning Methodology for Normally-OFF Fully Vertical GaN Trench MOSFETs</title><source>Publicly Available Content Database</source><creator>Ackermann, Valentin ; Mohamad, Blend ; El Rammouz, Hala ; Maurya, Vishwajeet ; Frayssinet, Eric ; Cordier, Yvon ; Charles, Matthew ; Lefevre, Gauthier ; Buckley, Julien ; Salem, Bassem</creator><creatorcontrib>Ackermann, Valentin ; Mohamad, Blend ; El Rammouz, Hala ; Maurya, Vishwajeet ; Frayssinet, Eric ; Cordier, Yvon ; Charles, Matthew ; Lefevre, Gauthier ; Buckley, Julien ; Salem, Bassem</creatorcontrib><description>In this work, fully vertical GaN trench MOSFETs were fabricated and characterized to evaluate their electrical performances. Transistors show a normally-OFF behavior with a high I[sub.ON]/I[sub.OFF] (~10[sup.9]) ratio and a significantly small gate leakage current (10[sup.−11] A/mm). Thanks to an improved resistance partitioning method, the resistances of the trench bottom and trench channel were extracted accurately by taking into account different charging conditions. This methodology enabled an estimation of the effective channel and bottom mobility of 11.1 cm[sup.2]/V·s and 15.1 cm[sup.2]/V·s, respectively.</description><identifier>ISSN: 2079-9292</identifier><identifier>EISSN: 2079-9292</identifier><identifier>DOI: 10.3390/electronics13122350</identifier><language>eng</language><publisher>Basel: MDPI AG</publisher><subject>Current leakage ; Electric fields ; Engineering Sciences ; Etching ; Gallium nitrate ; Gallium nitrides ; Leakage current ; Liquors ; Metal oxide semiconductor field effect transistors ; Methods ; MOSFETs ; Nitrides ; Partitioning ; Transistors</subject><ispartof>Electronics (Basel), 2024-06, Vol.13 (12), p.2350</ispartof><rights>COPYRIGHT 2024 MDPI AG</rights><rights>2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><rights>Attribution</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0003-0082-9903 ; 0009-0001-8159-882X ; 0000-0001-8038-3205 ; 0000-0003-3720-9409 ; 0000-0003-0668-8865</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.proquest.com/docview/3072317301/fulltextPDF?pq-origsite=primo$$EPDF$$P50$$Gproquest$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.proquest.com/docview/3072317301?pq-origsite=primo$$EHTML$$P50$$Gproquest$$Hfree_for_read</linktohtml><link.rule.ids>230,314,780,784,885,25753,27924,27925,37012,44590,75126</link.rule.ids><backlink>$$Uhttps://hal.science/hal-04673055$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Ackermann, Valentin</creatorcontrib><creatorcontrib>Mohamad, Blend</creatorcontrib><creatorcontrib>El Rammouz, Hala</creatorcontrib><creatorcontrib>Maurya, Vishwajeet</creatorcontrib><creatorcontrib>Frayssinet, Eric</creatorcontrib><creatorcontrib>Cordier, Yvon</creatorcontrib><creatorcontrib>Charles, Matthew</creatorcontrib><creatorcontrib>Lefevre, Gauthier</creatorcontrib><creatorcontrib>Buckley, Julien</creatorcontrib><creatorcontrib>Salem, Bassem</creatorcontrib><title>Mobility Extraction Using Improved Resistance Partitioning Methodology for Normally-OFF Fully Vertical GaN Trench MOSFETs</title><title>Electronics (Basel)</title><description>In this work, fully vertical GaN trench MOSFETs were fabricated and characterized to evaluate their electrical performances. Transistors show a normally-OFF behavior with a high I[sub.ON]/I[sub.OFF] (~10[sup.9]) ratio and a significantly small gate leakage current (10[sup.−11] A/mm). Thanks to an improved resistance partitioning method, the resistances of the trench bottom and trench channel were extracted accurately by taking into account different charging conditions. This methodology enabled an estimation of the effective channel and bottom mobility of 11.1 cm[sup.2]/V·s and 15.1 cm[sup.2]/V·s, respectively.</description><subject>Current leakage</subject><subject>Electric fields</subject><subject>Engineering Sciences</subject><subject>Etching</subject><subject>Gallium nitrate</subject><subject>Gallium nitrides</subject><subject>Leakage current</subject><subject>Liquors</subject><subject>Metal oxide semiconductor field effect transistors</subject><subject>Methods</subject><subject>MOSFETs</subject><subject>Nitrides</subject><subject>Partitioning</subject><subject>Transistors</subject><issn>2079-9292</issn><issn>2079-9292</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><sourceid>PIMPY</sourceid><recordid>eNpNkE9LAzEQxRdRUKqfwEvAk4fVJLPbNMdSbBX6R9R6XbLptI2km5qkxf32ZqkHZw7zePwY3kyW3TL6ACDpI1rU0bvG6MCAcQ4lPcuuOBUyl1zy83_6MrsJ4YumkgwGQK-yduZqY01sydNP9EpH4xqyDKbZkJfd3rsjrsgbBhOiajSSV-Wj6ZgOmGHcupWzbtOStfNk7vxOWdvmi_GYjA9JkU9MvFaWTNScfHhs9JbMFu_jp49wnV2slQ148zd72TLZo-d8upi8jIbTfMOBxRw5XWGhBGVlKWpGC4QBYwC8r2VdgxS65Kk0Z8VAi7JfUA1Q1ANBUQNXCnrZ_WnvVtlq781O-bZyylTPw2nVebToC6BleWSJvTux6fLvA4ZYfbmDb1K8CqhIeRLYUQ8naqMsVqZZu-5zqVe4M9o1uDbJHwopC-AlMPgF601_WA</recordid><startdate>20240601</startdate><enddate>20240601</enddate><creator>Ackermann, Valentin</creator><creator>Mohamad, Blend</creator><creator>El Rammouz, Hala</creator><creator>Maurya, Vishwajeet</creator><creator>Frayssinet, Eric</creator><creator>Cordier, Yvon</creator><creator>Charles, Matthew</creator><creator>Lefevre, Gauthier</creator><creator>Buckley, Julien</creator><creator>Salem, Bassem</creator><general>MDPI AG</general><general>MDPI</general><scope>7SP</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>L7M</scope><scope>P5Z</scope><scope>P62</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>1XC</scope><scope>VOOES</scope><orcidid>https://orcid.org/0000-0003-0082-9903</orcidid><orcidid>https://orcid.org/0009-0001-8159-882X</orcidid><orcidid>https://orcid.org/0000-0001-8038-3205</orcidid><orcidid>https://orcid.org/0000-0003-3720-9409</orcidid><orcidid>https://orcid.org/0000-0003-0668-8865</orcidid></search><sort><creationdate>20240601</creationdate><title>Mobility Extraction Using Improved Resistance Partitioning Methodology for Normally-OFF Fully Vertical GaN Trench MOSFETs</title><author>Ackermann, Valentin ; Mohamad, Blend ; El Rammouz, Hala ; Maurya, Vishwajeet ; Frayssinet, Eric ; Cordier, Yvon ; Charles, Matthew ; Lefevre, Gauthier ; Buckley, Julien ; Salem, Bassem</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-g231t-e20de4a701557b104e38113326c9bb397c52222c2148c75640c334b870ec32aa3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Current leakage</topic><topic>Electric fields</topic><topic>Engineering Sciences</topic><topic>Etching</topic><topic>Gallium nitrate</topic><topic>Gallium nitrides</topic><topic>Leakage current</topic><topic>Liquors</topic><topic>Metal oxide semiconductor field effect transistors</topic><topic>Methods</topic><topic>MOSFETs</topic><topic>Nitrides</topic><topic>Partitioning</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ackermann, Valentin</creatorcontrib><creatorcontrib>Mohamad, Blend</creatorcontrib><creatorcontrib>El Rammouz, Hala</creatorcontrib><creatorcontrib>Maurya, Vishwajeet</creatorcontrib><creatorcontrib>Frayssinet, Eric</creatorcontrib><creatorcontrib>Cordier, Yvon</creatorcontrib><creatorcontrib>Charles, Matthew</creatorcontrib><creatorcontrib>Lefevre, Gauthier</creatorcontrib><creatorcontrib>Buckley, Julien</creatorcontrib><creatorcontrib>Salem, Bassem</creatorcontrib><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Central (Alumni)</collection><collection>ProQuest Central</collection><collection>Advanced Technologies &amp; Aerospace Collection</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ProQuest advanced technologies &amp; aerospace journals</collection><collection>ProQuest Advanced Technologies &amp; Aerospace Collection</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Hyper Article en Ligne (HAL)</collection><collection>Hyper Article en Ligne (HAL) (Open Access)</collection><jtitle>Electronics (Basel)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ackermann, Valentin</au><au>Mohamad, Blend</au><au>El Rammouz, Hala</au><au>Maurya, Vishwajeet</au><au>Frayssinet, Eric</au><au>Cordier, Yvon</au><au>Charles, Matthew</au><au>Lefevre, Gauthier</au><au>Buckley, Julien</au><au>Salem, Bassem</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Mobility Extraction Using Improved Resistance Partitioning Methodology for Normally-OFF Fully Vertical GaN Trench MOSFETs</atitle><jtitle>Electronics (Basel)</jtitle><date>2024-06-01</date><risdate>2024</risdate><volume>13</volume><issue>12</issue><spage>2350</spage><pages>2350-</pages><issn>2079-9292</issn><eissn>2079-9292</eissn><abstract>In this work, fully vertical GaN trench MOSFETs were fabricated and characterized to evaluate their electrical performances. Transistors show a normally-OFF behavior with a high I[sub.ON]/I[sub.OFF] (~10[sup.9]) ratio and a significantly small gate leakage current (10[sup.−11] A/mm). Thanks to an improved resistance partitioning method, the resistances of the trench bottom and trench channel were extracted accurately by taking into account different charging conditions. This methodology enabled an estimation of the effective channel and bottom mobility of 11.1 cm[sup.2]/V·s and 15.1 cm[sup.2]/V·s, respectively.</abstract><cop>Basel</cop><pub>MDPI AG</pub><doi>10.3390/electronics13122350</doi><orcidid>https://orcid.org/0000-0003-0082-9903</orcidid><orcidid>https://orcid.org/0009-0001-8159-882X</orcidid><orcidid>https://orcid.org/0000-0001-8038-3205</orcidid><orcidid>https://orcid.org/0000-0003-3720-9409</orcidid><orcidid>https://orcid.org/0000-0003-0668-8865</orcidid><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 2079-9292
ispartof Electronics (Basel), 2024-06, Vol.13 (12), p.2350
issn 2079-9292
2079-9292
language eng
recordid cdi_hal_primary_oai_HAL_hal_04673055v1
source Publicly Available Content Database
subjects Current leakage
Electric fields
Engineering Sciences
Etching
Gallium nitrate
Gallium nitrides
Leakage current
Liquors
Metal oxide semiconductor field effect transistors
Methods
MOSFETs
Nitrides
Partitioning
Transistors
title Mobility Extraction Using Improved Resistance Partitioning Methodology for Normally-OFF Fully Vertical GaN Trench MOSFETs
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T12%3A59%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-gale_hal_p&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Mobility%20Extraction%20Using%20Improved%20Resistance%20Partitioning%20Methodology%20for%20Normally-OFF%20Fully%20Vertical%20GaN%20Trench%20MOSFETs&rft.jtitle=Electronics%20(Basel)&rft.au=Ackermann,%20Valentin&rft.date=2024-06-01&rft.volume=13&rft.issue=12&rft.spage=2350&rft.pages=2350-&rft.issn=2079-9292&rft.eissn=2079-9292&rft_id=info:doi/10.3390/electronics13122350&rft_dat=%3Cgale_hal_p%3EA799432531%3C/gale_hal_p%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-g231t-e20de4a701557b104e38113326c9bb397c52222c2148c75640c334b870ec32aa3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=3072317301&rft_id=info:pmid/&rft_galeid=A799432531&rfr_iscdi=true