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Mobility Extraction Using Improved Resistance Partitioning Methodology for Normally-OFF Fully Vertical GaN Trench MOSFETs
In this work, fully vertical GaN trench MOSFETs were fabricated and characterized to evaluate their electrical performances. Transistors show a normally-OFF behavior with a high I[sub.ON]/I[sub.OFF] (~10[sup.9]) ratio and a significantly small gate leakage current (10[sup.−11] A/mm). Thanks to an im...
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Published in: | Electronics (Basel) 2024-06, Vol.13 (12), p.2350 |
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creator | Ackermann, Valentin Mohamad, Blend El Rammouz, Hala Maurya, Vishwajeet Frayssinet, Eric Cordier, Yvon Charles, Matthew Lefevre, Gauthier Buckley, Julien Salem, Bassem |
description | In this work, fully vertical GaN trench MOSFETs were fabricated and characterized to evaluate their electrical performances. Transistors show a normally-OFF behavior with a high I[sub.ON]/I[sub.OFF] (~10[sup.9]) ratio and a significantly small gate leakage current (10[sup.−11] A/mm). Thanks to an improved resistance partitioning method, the resistances of the trench bottom and trench channel were extracted accurately by taking into account different charging conditions. This methodology enabled an estimation of the effective channel and bottom mobility of 11.1 cm[sup.2]/V·s and 15.1 cm[sup.2]/V·s, respectively. |
doi_str_mv | 10.3390/electronics13122350 |
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subjects | Current leakage Electric fields Engineering Sciences Etching Gallium nitrate Gallium nitrides Leakage current Liquors Metal oxide semiconductor field effect transistors Methods MOSFETs Nitrides Partitioning Transistors |
title | Mobility Extraction Using Improved Resistance Partitioning Methodology for Normally-OFF Fully Vertical GaN Trench MOSFETs |
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