Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors

The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the si...

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Bibliographic Details
Published in:Croatica Chemica Acta 2017, Vol.90 (2), p.C1
Main Authors: Gebavi, Hrvoje, Mikac, Lara, Marciuš, Marijan, Šikic, Mile, Mohaček-Grošev, Vlasta, Janči, Tibor, Vidaćek, Sanja, Hasanspahić, Emina, Omanović Miklićanin, Enisa, Ivanda, Mile
Format: Article
Language:English
Subjects:
Chemical detectors
electroless chemical etching
Nanoparticles
Production processes
Raman spectroscopy
rhodamine
Silicon
silicon nanowires
surface enhanced Raman spectroscopy
Technology application
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Summary:The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the silicon nanowires coated with silver nanoparticles has been examined by scanning electron microscopy. The SERS measurements tested on rhodamine 6G molecules indicated the optimal silicon nanowire substrate production obtained for 5 M hydrofluoric acid and 30 mM silver nitrate etching solution. The results show SERS detection limit of 10–8 M rhodamine in aqueous solution. This work is licensed under a Creative Commons Attribution 4.0 International License .
ISSN:0011-1643
1334-417X
DOI:10.5562/cca3127