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Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors
The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the si...
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Published in: | Croatica Chemica Acta 2017, Vol.90 (2), p.C1 |
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creator | Gebavi, Hrvoje Mikac, Lara Marciuš, Marijan Šikic, Mile Mohaček-Grošev, Vlasta Janči, Tibor Vidaćek, Sanja Hasanspahić, Emina Omanović Miklićanin, Enisa Ivanda, Mile |
description | The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the silicon nanowires coated with silver nanoparticles has been examined by scanning electron microscopy. The SERS measurements tested on rhodamine 6G molecules indicated the optimal silicon nanowire substrate production obtained for 5 M hydrofluoric acid and 30 mM silver nitrate etching solution. The results show SERS detection limit of 10–8 M rhodamine in aqueous solution.
This work is licensed under a Creative Commons Attribution 4.0 International License . |
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fullrecord | <record><control><sourceid>gale_hrcak</sourceid><recordid>TN_cdi_hrcak_primary_oai_hrcak_srce_hr_185891</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><galeid>A510297771</galeid><sourcerecordid>A510297771</sourcerecordid><originalsourceid>FETCH-LOGICAL-c335t-5c7eeb9a8e15a4c3dadb9bdd29cec0dc382ce2635fde05ea22109be2c447e66b3</originalsourceid><addsrcrecordid>eNo9kd9Lw0AMxw9RcE7xX-ibT533o9cfj2NsKgwF68C3kuZSd9q1464q---9siF5SPjmk4QkjN0KPtM6lfeIoITMzthEKJXEicjez9mEcyFikSbqkl15_8m51InOJ2xb2tZi30XP0PW_1pGPyu_aDw6GEK6gdhZhsAFoehdt2pCIS-q8HewPBdQ1gBQtuy10SCZ6hR10UbknHFzvsd8fopHunb9mFw20nm5Ofso2q-Xb4jFevzw8LebrGJXSQ6wxI6oLyEloSFAZMHVRGyMLJOQGVS6RZKp0Y4hrAikFL2qSmCQZpWmtpiw-9t06hK9q7-wO3KHqwVZHxTukEFYi13khAj878h_QUmW7pg8rYjBDu_Ew1Nigz7XgssiybCy4OxZg2NA7av5nCF6NH6hOH1B_JYF8OA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors</title><source>Publicly Available Content Database</source><creator>Gebavi, Hrvoje ; Mikac, Lara ; Marciuš, Marijan ; Šikic, Mile ; Mohaček-Grošev, Vlasta ; Janči, Tibor ; Vidaćek, Sanja ; Hasanspahić, Emina ; Omanović Miklićanin, Enisa ; Ivanda, Mile</creator><creatorcontrib>Gebavi, Hrvoje ; Mikac, Lara ; Marciuš, Marijan ; Šikic, Mile ; Mohaček-Grošev, Vlasta ; Janči, Tibor ; Vidaćek, Sanja ; Hasanspahić, Emina ; Omanović Miklićanin, Enisa ; Ivanda, Mile</creatorcontrib><description>The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the silicon nanowires coated with silver nanoparticles has been examined by scanning electron microscopy. The SERS measurements tested on rhodamine 6G molecules indicated the optimal silicon nanowire substrate production obtained for 5 M hydrofluoric acid and 30 mM silver nitrate etching solution. The results show SERS detection limit of 10–8 M rhodamine in aqueous solution.
This work is licensed under a Creative Commons Attribution 4.0 International License .</description><identifier>ISSN: 0011-1643</identifier><identifier>EISSN: 1334-417X</identifier><identifier>DOI: 10.5562/cca3127</identifier><identifier>CODEN: CCACAA</identifier><language>eng</language><publisher>Croatica Chemica Acta</publisher><subject>Chemical detectors ; electroless chemical etching ; Nanoparticles ; Production processes ; Raman spectroscopy ; rhodamine ; Silicon ; silicon nanowires ; surface enhanced Raman spectroscopy ; Technology application</subject><ispartof>Croatica Chemica Acta, 2017, Vol.90 (2), p.C1</ispartof><rights>COPYRIGHT 2017 Croatica Chemica Acta</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c335t-5c7eeb9a8e15a4c3dadb9bdd29cec0dc382ce2635fde05ea22109be2c447e66b3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Uhttps://hrcak.srce.hr/logo_broj/14850.jpg</thumbnail><link.rule.ids>230,314,780,784,885,4021,27921,27922,27923</link.rule.ids></links><search><creatorcontrib>Gebavi, Hrvoje</creatorcontrib><creatorcontrib>Mikac, Lara</creatorcontrib><creatorcontrib>Marciuš, Marijan</creatorcontrib><creatorcontrib>Šikic, Mile</creatorcontrib><creatorcontrib>Mohaček-Grošev, Vlasta</creatorcontrib><creatorcontrib>Janči, Tibor</creatorcontrib><creatorcontrib>Vidaćek, Sanja</creatorcontrib><creatorcontrib>Hasanspahić, Emina</creatorcontrib><creatorcontrib>Omanović Miklićanin, Enisa</creatorcontrib><creatorcontrib>Ivanda, Mile</creatorcontrib><title>Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors</title><title>Croatica Chemica Acta</title><description>The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the silicon nanowires coated with silver nanoparticles has been examined by scanning electron microscopy. The SERS measurements tested on rhodamine 6G molecules indicated the optimal silicon nanowire substrate production obtained for 5 M hydrofluoric acid and 30 mM silver nitrate etching solution. The results show SERS detection limit of 10–8 M rhodamine in aqueous solution.
This work is licensed under a Creative Commons Attribution 4.0 International License .</description><subject>Chemical detectors</subject><subject>electroless chemical etching</subject><subject>Nanoparticles</subject><subject>Production processes</subject><subject>Raman spectroscopy</subject><subject>rhodamine</subject><subject>Silicon</subject><subject>silicon nanowires</subject><subject>surface enhanced Raman spectroscopy</subject><subject>Technology application</subject><issn>0011-1643</issn><issn>1334-417X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2017</creationdate><recordtype>article</recordtype><recordid>eNo9kd9Lw0AMxw9RcE7xX-ibT533o9cfj2NsKgwF68C3kuZSd9q1464q---9siF5SPjmk4QkjN0KPtM6lfeIoITMzthEKJXEicjez9mEcyFikSbqkl15_8m51InOJ2xb2tZi30XP0PW_1pGPyu_aDw6GEK6gdhZhsAFoehdt2pCIS-q8HewPBdQ1gBQtuy10SCZ6hR10UbknHFzvsd8fopHunb9mFw20nm5Ofso2q-Xb4jFevzw8LebrGJXSQ6wxI6oLyEloSFAZMHVRGyMLJOQGVS6RZKp0Y4hrAikFL2qSmCQZpWmtpiw-9t06hK9q7-wO3KHqwVZHxTukEFYi13khAj878h_QUmW7pg8rYjBDu_Ew1Nigz7XgssiybCy4OxZg2NA7av5nCF6NH6hOH1B_JYF8OA</recordid><startdate>2017</startdate><enddate>2017</enddate><creator>Gebavi, Hrvoje</creator><creator>Mikac, Lara</creator><creator>Marciuš, Marijan</creator><creator>Šikic, Mile</creator><creator>Mohaček-Grošev, Vlasta</creator><creator>Janči, Tibor</creator><creator>Vidaćek, Sanja</creator><creator>Hasanspahić, Emina</creator><creator>Omanović Miklićanin, Enisa</creator><creator>Ivanda, Mile</creator><general>Croatica Chemica Acta</general><general>Hrvatsko kemijsko društvo</general><scope>AAYXX</scope><scope>CITATION</scope><scope>VP8</scope></search><sort><creationdate>2017</creationdate><title>Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors</title><author>Gebavi, Hrvoje ; Mikac, Lara ; Marciuš, Marijan ; Šikic, Mile ; Mohaček-Grošev, Vlasta ; Janči, Tibor ; Vidaćek, Sanja ; Hasanspahić, Emina ; Omanović Miklićanin, Enisa ; Ivanda, Mile</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c335t-5c7eeb9a8e15a4c3dadb9bdd29cec0dc382ce2635fde05ea22109be2c447e66b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2017</creationdate><topic>Chemical detectors</topic><topic>electroless chemical etching</topic><topic>Nanoparticles</topic><topic>Production processes</topic><topic>Raman spectroscopy</topic><topic>rhodamine</topic><topic>Silicon</topic><topic>silicon nanowires</topic><topic>surface enhanced Raman spectroscopy</topic><topic>Technology application</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gebavi, Hrvoje</creatorcontrib><creatorcontrib>Mikac, Lara</creatorcontrib><creatorcontrib>Marciuš, Marijan</creatorcontrib><creatorcontrib>Šikic, Mile</creatorcontrib><creatorcontrib>Mohaček-Grošev, Vlasta</creatorcontrib><creatorcontrib>Janči, Tibor</creatorcontrib><creatorcontrib>Vidaćek, Sanja</creatorcontrib><creatorcontrib>Hasanspahić, Emina</creatorcontrib><creatorcontrib>Omanović Miklićanin, Enisa</creatorcontrib><creatorcontrib>Ivanda, Mile</creatorcontrib><collection>CrossRef</collection><collection>Hrcak: Portal of scientific journals of Croatia</collection><jtitle>Croatica Chemica Acta</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gebavi, Hrvoje</au><au>Mikac, Lara</au><au>Marciuš, Marijan</au><au>Šikic, Mile</au><au>Mohaček-Grošev, Vlasta</au><au>Janči, Tibor</au><au>Vidaćek, Sanja</au><au>Hasanspahić, Emina</au><au>Omanović Miklićanin, Enisa</au><au>Ivanda, Mile</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors</atitle><jtitle>Croatica Chemica Acta</jtitle><date>2017</date><risdate>2017</risdate><volume>90</volume><issue>2</issue><spage>C1</spage><pages>C1-</pages><issn>0011-1643</issn><eissn>1334-417X</eissn><coden>CCACAA</coden><abstract>The silicon based substrates for surface enhanced Raman spectroscopy (SERS) have been synthesized and tested. The silver-assisted electroless wet chemical etching method has been utilized for silicon nanowires production which has been proved as the promising SERS substrate. The morphology of the silicon nanowires coated with silver nanoparticles has been examined by scanning electron microscopy. The SERS measurements tested on rhodamine 6G molecules indicated the optimal silicon nanowire substrate production obtained for 5 M hydrofluoric acid and 30 mM silver nitrate etching solution. The results show SERS detection limit of 10–8 M rhodamine in aqueous solution.
This work is licensed under a Creative Commons Attribution 4.0 International License .</abstract><pub>Croatica Chemica Acta</pub><doi>10.5562/cca3127</doi><oa>free_for_read</oa></addata></record> |
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subjects | Chemical detectors electroless chemical etching Nanoparticles Production processes Raman spectroscopy rhodamine Silicon silicon nanowires surface enhanced Raman spectroscopy Technology application |
title | Silicon Nanowires Substrates Fabrication for Ultra-Sensitive Surface Enhanced Raman Spectroscopy Sensors |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T12%3A29%3A50IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-gale_hrcak&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Silicon%20Nanowires%20Substrates%20Fabrication%20for%20Ultra-Sensitive%20Surface%20Enhanced%20Raman%20Spectroscopy%20Sensors&rft.jtitle=Croatica%20Chemica%20Acta&rft.au=Gebavi,%20Hrvoje&rft.date=2017&rft.volume=90&rft.issue=2&rft.spage=C1&rft.pages=C1-&rft.issn=0011-1643&rft.eissn=1334-417X&rft.coden=CCACAA&rft_id=info:doi/10.5562/cca3127&rft_dat=%3Cgale_hrcak%3EA510297771%3C/gale_hrcak%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c335t-5c7eeb9a8e15a4c3dadb9bdd29cec0dc382ce2635fde05ea22109be2c447e66b3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_galeid=A510297771&rfr_iscdi=true |