Subspace Identification of a MIMO Wafer Rapid Thermal Processing System

This paper studies the subspace identification of a MIMO wafer rapid thermal processing (RTP) system driven by standard tungsten halogen lamps and output temperatures for the RTP system are measured by pyrometers. In order to estimate a linearized dynamic model for the nonlinear RTP system at an env...

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Bibliographic Details
Main Authors: Liu, Xiao-You, Bian, Yan, Geng, Li-Hui
Format: Conference Proceeding
Language:English
Subjects:
MIMO
Process control
Rapid thermal processing
Semiconductor device modeling
Subspace Identification
Temperature measurement
Time-frequency analysis
Tracking loops
Tungsten
Wafer
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Summary:This paper studies the subspace identification of a MIMO wafer rapid thermal processing (RTP) system driven by standard tungsten halogen lamps and output temperatures for the RTP system are measured by pyrometers. In order to estimate a linearized dynamic model for the nonlinear RTP system at an environmental temperature, input voltages for the lamps are selected as mutually independent pseudo-random binary series (PRBS). To design such PRBS to persistently excite the system, several pre-experiments for determining its settling time and maximum frequency are needed to be designed beforehand. Finally, the effectiveness of the identification method is verified by a numerical simulation.
ISSN:2688-0938
DOI:10.1109/CAC57257.2022.10054739